Facile chemical solution deposition of nanocrystalline CrN thin films with low magnetoresistance

Abstract

Polycrystalline CrN thin films were first prepared by a facile chemical solution deposition method.

A General Method for Constructing Two-Dimensional Layered Mesoporous Mono- and Binary-Transition-Metal Nitride/Graphene as an Ultra-Efficient Support to Enhance Its Catalytic Activity and Durability for Electrocatalytic Application

“…The XRD patterns of 2D layered mesoporous TiN/G, Ti 0.5 Cr 0.5 N/G, and CrN/G nanocomposites and Pt/TiN/G, Pt/Ti 0.5 Cr 0.5 N/G, and Pt/CrN/G are shown in Figure e. Three strong diffraction peaks centered at 36.6°, 42.6°, and 61.8° in TiN/G, corresponding to the (111), (200), and (220) lattice planes of TiN, are observed, suggesting the formation of face centered cubic (FCC) TiN (JCPDS #38-1420). , The XRD pattern of CrN/G can be indexed well with the expected FCC CrN (JCPDS #65-9001) . The diffraction peaks at 36.2°, 42.2°, 61.3°, 73.4°, and 77.3° can be assigned to the (111), (200), (220), (311), and (222) lattice planes of FCC Ti 0.5 Cr 0.5 N (JCPDS #04-016–6620). , The diffraction peaks are similar to those of TiN/G and CrN/G and are located between the diffraction peaks of TiN/G and CrN/G, indicating the formation of Ti 0.5 Cr 0.5 N solid solution.…”

Annealing Effects on the Grain Growth and Electrical Properties of ZrO2 Buffered Chromium Nitride Thin Films

“…Furthermore, the CrN thin films were deposited on the ZrO 2 buffered Al 2 O 3 single crystal substrate, where chromium nitrate and 2-methoxyethanol were used to synthesize the CrN precursor. 19 Finally, the pyrolysis films were respectively annealed at 750, 800, 850, 900, 950, and 1000 °C for 2 h in a flowing ammonia atmosphere. The derived CrN thin films with each corresponding temperature are respectively denoted as T750, T800, T850, T900, T950, and T1000 in order to simplify the description.…”

“…After they were baked at 350 °C for 10 min in air, the as-deposited films were finally annealed at 1000 °C for 2 h to get a polycrystalline ZrO 2 buffered substrate. Furthermore, the CrN thin films were deposited on the ZrO 2 buffered Al 2 O 3 single crystal substrate, where chromium nitrate and 2-methoxyethanol were used to synthesize the CrN precursor . Finally, the pyrolysis films were respectively annealed at 750, 800, 850, 900, 950, and 1000 °C for 2 h in a flowing ammonia atmosphere.…”

“…The chemical solution deposition (CSD) method, as an alternative approach widely used to obtain large-scale functional thin films with low cost, had been used to deposit metal nitride including CrN thin films, where the ammonia was used to control the nitrogen content. , Nevertheless, compared to the vacuum ways, a high annealing temperature is usually needed. In additional, because of a large misfit thermal expansion coefficient (TEC) and dewetting existing between the film and the substrate, cracks (wrinkles) and even falling off are much more likely to occur.…”

The Effect of Gradient Bias Design on Electrochemistry and Tribology Behaviors of PVD CrN Film in a Simulative Marine Environment

“…Multi-arc ion plating technique is commonly used to prepare dense protective film, which can deposit solid materials in the forms of atoms or molecules onto substrate [ 5 ]. Among all films, CrN-based hard film has been widely used in many fields such as machining, metallurgy casting, decorative film and aerospace because of its high hardness, strong wear resistance, excellent chemical inertness and outstanding temperature oxidation resistance [ 6 , 7 , 8 , 9 , 10 ]. Xu et al [ 11 ] explored the effect of deposition parameters on the composition, structures, density and topography of CrN films, and confirmed that the deposition parameters played a key role to affect the composition and structure of CrN film.…”