2023
DOI: 10.1021/acsami.3c07305
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Facile and Scalable Development of High-Performance Carbon-Free Tin-Based Anodes for Sodium-Ion Batteries

Abstract: Tin (Sn)-based anodes for sodium (Na)-ion batteries possess higher Na-storage capacity and better safety aspects compared to hard carbon -based anodes but suffer from poor cyclic stability due to volume expansion/contraction and concomitant loss in mechanical integrity during sodiation/ desodiation. To address this, the usage of nanoscaled electrodeactive particles and nanoscaled-carbon-based buffers has been explored, but with compromises with the tap density, accrued irreversible surface reactions, overall c… Show more

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Cited by 4 publications
(1 citation statement)
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“…In-plane equi-biaxial stress was then estimated from the substrate curvature data using Stoney's equation [σ = Eh s 2 /6(1-ν)h f R; where, E, h s, and ʋ are Young's modulus, thickness, and Poisson's ratio of the substrate, respectively, and h f is the thickness of the active film (Si)], which is also mentioned, along with further details of the setup and terminologies used, in our previously published works. 34,[52][53][54] Since the as-measured substrate curvature has been normalized by the initial thickness of the Si film and not the instantaneous thickness with progress in lithiation/ delithiation, the as-reported stress has been referred to as "nominal stress." In addition to the stress measurements during galvanostatic cycling, the stress development associated just with the SEI formation was monitored by holding the cells at a constant potential of 0.8 V (vs. Li/Li + ) for 20 h (as per pre-established protocols) in the presence of the two electrolyte types (viz., with and without FEC).…”
Section: Methodsmentioning
confidence: 99%
“…In-plane equi-biaxial stress was then estimated from the substrate curvature data using Stoney's equation [σ = Eh s 2 /6(1-ν)h f R; where, E, h s, and ʋ are Young's modulus, thickness, and Poisson's ratio of the substrate, respectively, and h f is the thickness of the active film (Si)], which is also mentioned, along with further details of the setup and terminologies used, in our previously published works. 34,[52][53][54] Since the as-measured substrate curvature has been normalized by the initial thickness of the Si film and not the instantaneous thickness with progress in lithiation/ delithiation, the as-reported stress has been referred to as "nominal stress." In addition to the stress measurements during galvanostatic cycling, the stress development associated just with the SEI formation was monitored by holding the cells at a constant potential of 0.8 V (vs. Li/Li + ) for 20 h (as per pre-established protocols) in the presence of the two electrolyte types (viz., with and without FEC).…”
Section: Methodsmentioning
confidence: 99%