1996
DOI: 10.1016/0167-9317(95)00295-2
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Fabrication technologies for microsystems utilizing photoetchable glass

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Cited by 153 publications
(96 citation statements)
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“…For instance, photoresists respond to light by breaking or reforming bonds, leading to pattern formation in the material. Alternatively, LDW can cause defects in photoetchable glass ceramics 20 or other optical materials through single-and multiphoton mechanisms, 21 enabling novel applications in optical storage, 22 photonic devices, 23,24 and microfluidics.…”
Section: Laser Direct-write Modification (Ldwm)mentioning
confidence: 99%
“…For instance, photoresists respond to light by breaking or reforming bonds, leading to pattern formation in the material. Alternatively, LDW can cause defects in photoetchable glass ceramics 20 or other optical materials through single-and multiphoton mechanisms, 21 enabling novel applications in optical storage, 22 photonic devices, 23,24 and microfluidics.…”
Section: Laser Direct-write Modification (Ldwm)mentioning
confidence: 99%
“…6,7 Since they possess similar physical, chemical, and electrical properties, we expect them to show similar behavior.…”
Section: Introductionmentioning
confidence: 99%
“…This creates an invisible image on the substrate. Approximately 2 J/cm 2 of energy density is required to sufficiently structurize a 1 mm thick substrate [56]. A heat treatment cycle is then required to form large lithium metasilicate (Li 2 SiO 3 ) nuclei which etch nearly 20 times faster than the unprocessed glass in dilute HF acid.…”
Section: Photodefinable Glass Substratesmentioning
confidence: 99%