1995
DOI: 10.1049/el:19950082
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Fabrication technique for Si single-electron transistor operating at room temperature

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Cited by 342 publications
(166 citation statements)
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“…have been able to fabricate doped silicon bridges that show room temperature Coulomb blockade. 21 Together with a rareearth magnet with surface fields ϳ1 T, one may be able to implement this technique at room temperature. A limitation of these effects is the fact that the spring constant and damping constant modifications are not independent; they are both functions of V DS and V G .…”
Section: ͑3͒mentioning
confidence: 99%
“…have been able to fabricate doped silicon bridges that show room temperature Coulomb blockade. 21 Together with a rareearth magnet with surface fields ϳ1 T, one may be able to implement this technique at room temperature. A limitation of these effects is the fact that the spring constant and damping constant modifications are not independent; they are both functions of V DS and V G .…”
Section: ͑3͒mentioning
confidence: 99%
“…1 However, the reliability of room-temperature ͑RT͒ operation and requirement of complementary metal-oxide-semiconductor-compatible processes have been the main bottlenecks for implementing further practical device applications. Significant earlier work has been aimed at implementing a RT-operating SET, using various schemes, device structures, and fabrication processes, [2][3][4][5][6][7] but reliable processes for the controlled fabrication of ultrasmall size Coulomb islands of less than 5 nm have not been firmly established yet, limiting practical device applications at RT.…”
mentioning
confidence: 99%
“…[2]). Let us mention, for example, room temperature memory effects [3], a single-electron transistor with visible charging effects up to 300 K [4] using silicon-based structures, a gated system of metal grains [5] operating at 77 K, and room-temperature single-electron transistor fabricated by nanooxidation process [6].…”
mentioning
confidence: 99%