Fabrication System for Large-Area Seamless Nanopatterned Cylinder Mold Using the Spiral Laser Interference Exposure Method

Abstract

With the advancement in the field of nanotechnology, nanopatterning finds extensive application not only in high value-added products but also in inexpensive products. In addition, the technology required for the mass production of inexpensive products, such as the continuous roll-to-roll (R2R) process, is rapidly emerging. Extensive research has been conducted on the manufacture of submicron- and nano- molds. In this study, we have proposed a laser interference exposure for fabricating nanopatterned cylindrical molds that can be used in continuous roll-to-roll patterning. Additionally, we have demonstrated spiral exposure process to fabricate a seamless patterning on a cylinder (length of 300 mm and diameter of 100 mm) using a prism. The pattern was transferred to the flat mold using UV resin and measured using a field emission scanning electron microscope; the pattern was measured to have a uniform with nano pattern line width (75 nm) and a sub-micron period (286 nm). It was observed that the proposed method for fabrication of the roll mold using laser interference lithography is a fast and reliable seamless patterning.