Fabrication processing effects on the microstructure and morphology of erbium film

Abstract

Fabrication processing effects on the microstructure and morphology of erbium film * Shen Hua-Hai(申华海) a) , Peng Shu-Ming(彭述明) b) , Long Xing-Gui(龙兴贵) b) , Zhou Xiao-Song(周晓松) b) , Yang Li(杨 莉) a) , Liu Jin-Hua(刘锦华) b) , Sun Qing-Qiang(孙庆强) a) , and Zu Xiao-Tao(祖小涛) a) †

Analytical interactomic potential for a molybdenum–erbium system

“…To get more fitting data of the Mo-Er system, we calculate the surface energies of (1 0 0), (1 1 1) and (1 1 0) surfaces of bcc Mo using the VASP code, and find the (1 1 0) surface is energetically more favorable than the other two surfaces. Moreover, the (1 1 0), (2 0 0) and (2 2 1) planes of Mo were evidently observed in the experimental results of as-growth erbium films [9,30]. Therefore, the (1 1 0) surface of bcc Mo is possibly favorable for Er growth, and the adsorption behavior of Er on the Mo (1 1 0) surface is mainly studied in the present work.…”

“…One of the most challenging is lack of safe, reliable, compact and effective hydrogen storage technologies [1,2]. Rare-earth metal erbium (Er) has been extensively studied in theory and experiments in recent years [3][4][5][6][7][8][9][10][11][12]. The majority factor for the potential application of erbium is that erbium hydrides readily absorb hydrogen and have high thermal stability in comparison to titanium.…”

“…Because of high melting point, and low absorption of hydrogen or isotopes, molybdenum (Mo) is often chosen as film substrate material. In experiments, we have investigated the effect of substrate temperature on the microstructure and the morphology of Er film using x-ray diffraction (XRD) and scanning electron microscopy (SEM) [9]. The columnar grains were observed for all the presented Er films and the grains increase with increasing substrate temperature.…”

Effect of microstructure on 3 He migration in TiT 1.9 films

“…[3,[15][16][17][18] The structure of films could involve a number of characteristics, such as grain size, strain, crystallographic orientation, and so on. It was shown that the film structure was strongly affected by the preparation procedures and deposition condition, such as substrate temperature, [19,20] deposition rate, [21] substrate materials, [22] impurity contamination, and film thickness. [23][24][25] The purpose of this paper is to study 3 He migration in TiT 1.9 films.…”

Annealing effect of platinum-incorporated nanowires created by focused ion/electron-beam-induced deposition

“…[3][4][5][6][7][8] The single electron transistor (SET) is one of the most investigated nanodevices in recent years. [9][10][11][12][13] The photolithography, electron-beam lithography (EBL), electronbeam evaporation, and lift-off procedures are commonly used techniques in SET production. As mentioned before, the dual beam system is a nano-lithography alternative, and some efforts have been made to investigate the SET using FIBID or FEBID techniques.…”