Fabrication of ZrN Barrier Coatings for U-Mo Microspheres Via Fluidized Bed Chemical Vapor Deposition Using a Metalorganic Precursor

Sudderth, Laura; Perez-Nunez, Delia; Keiser, Dennis D.; McDeavitt, Sean M.

doi:10.1080/00295450.2017.1420336

Cited by 7 publications

(6 citation statements)

References 12 publications

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“…Nitridation treatment can also help to reduce fuel-cladding interactions when fuel swelling closes the fuel-cladding gap. Coating a ZrN thin film on U-Mo powder has been explored using physical vapor deposition and chemical vapor deposition to reduce the interaction of U-Mo fuel with the metal matrix [33][34][35]. Different from other coating methods, plasma nitridation can treat the inner surfaces of hollow fuel cladding tubes.…”

Section: Discussionmentioning

confidence: 99%

ZrN Phase Formation, Hardening and Nitrogen Diffusion Kinetics in Plasma Nitrided Zircaloy-4

et al. 2021

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Plasma nitridation was conducted to modify the surfaces of Zircaloy-4. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), and Raman analysis were used to characterize microstructures and phases. Surface indentation and cross-sectional indentation were performed to evaluate mechanical property changes. Nitridation forms a thin layer of ZrN phase, followed by a much deeper layer affected by nitrogen diffusion. The ZrN phase is confirmed by both TEM and Raman characterization. The Raman peaks of ZrN phase show a temperature dependence. The intensity increases with increasing nitridation temperatures, reaches a maximum at 700 °C, and then decreases at higher temperatures. The ZrN layer appears as continuous small columnar grains. The surface polycrystalline ZrN phase is harder than the bulk by a factor of ~8, and the nitrogen diffusion layer is harder by a factor of ~2–5. The activation energy of nitrogen diffusion was measured to be 2.88 eV. The thickness of the nitrogen-hardened layer is controllable by changing the nitridation temperature and duration.

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Section: Discussionmentioning

confidence: 99%

ZrN Phase Formation, Hardening and Nitrogen Diffusion Kinetics in Plasma Nitrided Zircaloy-4

et al. 2021

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“…These properties make them attractive for such applications as cutting tools, optical coatings, microelectronic contacts, and diffusion barriers. When deposited by CVD, ZrN has been grown by either inorganic (ZrCl 4 -N 2 -H 2 or ZrCl 4 -NH 3 ) [124,125] or organometallic [64,123,[126][127][128][129][130][131] (e.g., Zr(N(CH 3 ) 2 ) 4 -NH 3 ) routes.…”

Section: Zirconium Nitridementioning

confidence: 99%

“…With applications in such diverse fields as radiological coatings, optics, and microelectronics, deposition of zirconium nitrides (ZrN, Zr 3 N 4 ) at low temperatures (<500 • C) and with a low halide contamination have been of interest [123]. To that end, research has been reported for the deposition of ZrN from zirconium amido complexes, such as tetrakis(diethylamino)zirconium (Zr(NEt 2 ) 4 ) [64,123,[127][128][129]151,152], tetrakis(dimethylamino) zirconium (Zr(NMe 2 ) 4 ) [128][129][130][131]152,153], and tetrakis(ethylmethylamino)zirconium (Zr(NEtMe) 4 ) [129,152]. Deposition of ZrN from these organometallic precursors can be accomplished as a single-source precursor (e.g., Zr(NMe 2 ) 4 alone) [127][128][129][130][131]151] or in the presence of ammonia [123,129,152,153], nitrogen, or hydrogen [128].…”

Section: Organometallic Cvdmentioning

confidence: 99%

Chemical Vapor Deposition of Zirconium Compounds: A Review

Lamm

Mitchell

2023

Coatings

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Coatings of zirconium compounds are used in a wide variety of fields, yet an understanding and descriptions of deposition mechanisms are scant in the public literature. The mechanisms of deposition for metallic zirconium, ZrC, ZrN, ZrO2, ZrB2, and zirconium silicides are discussed based on the direct vapor deposition research of those compounds where possible or compared to complementary titanium systems when direct research is lacking. Both inorganic and organometallic deposition systems are discussed. As a class of compounds, an understanding of the vapor deposition mechanisms can be significantly improved by investigations on metallic zirconium deposition by zirconium halides and hydrogen and by in situ analysis techniques such as Fourier-transform infrared (FTIR) spectroscopy or x-ray photoelectron spectroscopy (XPS).

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“…In the twentieth century, with technological advancements, various experiments have been performed to get an insight into the enormous properties shown by ZrN. These include properties like oxidation and orientation of coatings at high temperatures, change of colour of the coating and nanostructural and nanomechanical properties of ZrN with continuous N 2 flow, barrier coatings in case of nuclear analysis, compatibility as human body implants, electrical, electronic and optical behaviours [15][16][17][18][19][20][21][22][23][24][25][26]. In recent years, ZrN has been marked as an alternative and preferred material for plasmonic applications along with titanium nitride due to its superiority over conventional noble metals like gold and silver [27][28][29].…”

Section: Introductionmentioning

confidence: 99%

Structure, stability and electronic properties of zirconium nitride nanoclusters

Bhagowati,

Sahariah

2023

Nanotechnology

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Zirconium nitride (ZrN) is an industrial material having very high melting point, hardness and chemical stability. Compared to the bulk ZrN, its nanoclusters are rarely explored. In this report, we generate a few small ZrN nanoclusters using ab-initio molecular dynamics simulation. We investigate their electronic properties in terms of Bader charge, electron localization function and density of states. The obtained results are compared with their bulk counterpart. We also study the static and dynamical stability of the nanoclusters with the help of binding energy, density of states and phonon dispersion spectra. The electron localization function of bulk ZrN is reported here for the ﬁrst time to better understand its often confusing bonding behaviour.

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Fabrication of ZrN Barrier Coatings for U-Mo Microspheres Via Fluidized Bed Chemical Vapor Deposition Using a Metalorganic Precursor

Cited by 7 publications

References 12 publications

ZrN Phase Formation, Hardening and Nitrogen Diffusion Kinetics in Plasma Nitrided Zircaloy-4

ZrN Phase Formation, Hardening and Nitrogen Diffusion Kinetics in Plasma Nitrided Zircaloy-4

Chemical Vapor Deposition of Zirconium Compounds: A Review

Structure, stability and electronic properties of zirconium nitride nanoclusters

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