2014
DOI: 10.1063/1.4866733
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Fabrication of ZnO nanorod using spray-pyrolysis and chemical bath deposition method

Abstract: ARTICLES YOU MAY BE INTERESTED INAbstract. ZnO thin films with nanorod structure were deposited using Ultrasonic Spray Pyrolysis method for seed growth, and Chemical Bath Deposition (CBD) for nanorod growth. High purity Zn-hydrate and Urea are used to control Ph were dissolved in ethanol and aqua bidest in Ultrasonic Spray Pyrolysis process. Glass substrate was placed above the heater plate of reaction chamber, and subsequently sprayed with the range duration of 5, 10 and 20 minutes at the temperatures of 3500… Show more

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Cited by 10 publications
(6 citation statements)
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“…It offers an exceedingly straightforward method for creating films of any composition. This technique has been utilized by researchers to create premium thin films that may be used in a variety of optical components [121,122,123,124].…”
Section: Other Thin-film Deposition Methodsmentioning
confidence: 99%
“…It offers an exceedingly straightforward method for creating films of any composition. This technique has been utilized by researchers to create premium thin films that may be used in a variety of optical components [121,122,123,124].…”
Section: Other Thin-film Deposition Methodsmentioning
confidence: 99%
“…The substrate was heated and kept at 400 °C on a hot plate and monitored by a K-type thermocouple. The precursor solution was continuously sprayed on the substrate for 10 min [ 4 , 18 , 34 ]. After the deposition process, each sample was left to dry on the hot plate for 5 min [ 4 , 35 ].…”
Section: Methodsmentioning
confidence: 99%
“…The seed layer acts as nucleation sites thereby maximizing the lattice matching of the substrate and nanorods ensuring vertical orientation of grown ZnO nanorods [ 16 ]. Various methods have been used for the deposition of the ZnO seed layers which include spray pyrolysis [ 4 , 17 , 18 , 19 ], sputtering [ 20 ], spin coating [ 8 , 21 ], dip coating [ 22 ], successive ionic layer adsorption and reaction (SILAR) [ 23 ] among others. Ultrasonic spray pyrolysis is a simple technique offering several advantages which include; low cost, better control of deposition rate and microstructures thickness, moderate deposition temperatures (300–500 °C) and wide coverage of uniform adherent films or nanoparticles [ 24 , 25 , 26 , 27 , 28 ].…”
Section: Introductionmentioning
confidence: 99%
“…It provides an incredibly simple technique to prepare films of any composition. Researchers have used this method to develop high-quality thin films which can be employed in different optical components [99][100][101][102]. Spray pyrolysis, on the other hand, has the fatal flaw of forming porous and/or hollow-structured particles [103,104].…”
Section: B Liquid-phase Depositionmentioning
confidence: 99%