Fabrication of zinc oxide thin film transistors using a facing-targets sputtering method

Study on the suitability of ZnO thin film for dynamic pressure sensing application

“…Deposition of ZnO thin films has been reported on various substrates such as glass (Hoon et al, 2011;Okada et al, 2013;Alias et al, 2013;Nurulfadzilah et al, 2014;Md Sin et al, 2011;Gupta et al, 2016;Nithya and Radhakrishnan, 2012;Salah et al, 2015;Jayaraman et al, 2015;Mariappan et al, 2014;Rao and Santhoshkumar, 2009), phynox (Joshi et al, 2012;Joshi et al, 2013a;Joshi et al, 2013b), silicon (Kutepova and Hall, 1998;Xia et al, 2013;Rajan et al, 2017;Chang et al, 2002;Kang et al, 2015;Deschanvres et al, 1992), sapphire (Gorla et al, 1999;Shim et al, 2002), polyamide (Munje et al, 2017), etc., by several researchers.…”

“…Various methods such as sputtering (Hoon et al, 2011;Kutepova and Hall, 1998;Xia et al, 2013;Yoon and Kim, 2006;Rajan et al, 2017;Munje et al, 2017;Nowek et al, 2016;Okada et al, 2013;Joshi et al, 2012;Joshi et al, 2013a;Joshi et al, 2013b;Alias et al, 2013;Chang et al, 2002;Bachari et al, 1999;Kang et al, 2015), Solgel (Foo et al, 2014;Nurulfadzilah et al, 2014;Chan et al, 2016;Md Sin et al, 2011;Gupta et al, 2016;Nithya and Radhakrishnan, 2012;Salah et al, 2015), spray pyrolysis (Jayaraman et al, 2015;Mariappan et al, 2014;Rao and Santhoshkumar, 2009), metal organic chemical vapor deposition (MOCVD) (Deschanvres et al, 1992;Shi et al, 2012;Su et al, 2011;Gorla et al, 1999), plasma enhanced atomic layer deposition (PEALD) (Gong and Jackson, 2017), pulsed laser deposition (Shim et al, 2002) are widely used for the preparation of ZnO thin film. Among these, sputtering has a faster deposition rate, better adhesion to substrate and can provide high purity films (Hoon et al, 2011;Alias et al, 2013).…”