2018
DOI: 10.1039/c8dt00352a
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Fabrication of zinc-dicarboxylate- and zinc-pyrazolate-carboxylate-framework thin films through vapour–solid deposition

Abstract: Fabrication of three-dimensional metal-organic framework (MOF) thin films has been investigated for the first time through the conversion of a ZnO layer via a pure vapour-solid deposition reaction at ambient pressure. The fabrication of MOF thin films with a dicarboxylate linker, (DMA)2[Zn3(bdc)4] (1) (bdc = 1,4-benzenedicarboxylate), and a carboxy-pyrazolate linker, [Zn4O(dmcapz)6] (2) (dmcapz = 3,5-dimethyl-4-carboxypyrazole), involves the deposition of the linker and/or the preparation of a composite film p… Show more

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Cited by 16 publications
(13 citation statements)
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“…Vapor-phase growth of MOFs is a rapidly expanding area, 20 as illustrated by reports on the deposition of ZIF-67, 21 CuBDC, 22 CuCDC, 22 HKUST-1, 23 and a Zn-carboxylate-pyrazolate MOF-5 isotype structure. 24 Furthermore, related approaches have been developed such as CVD of amorphous precursors followed by postdeposition crystallization to form MOF-5, 25 IRMOF-8, 26 UiO-66, 27 and UiO-66-NH 2 28 and the deposition of crystalline coordination compounds (e.g., MAF-252, 29 CaBDC, 30 and different CuBDC polymorphs 22,31 ). Moreover, MOF-CVD has been successfully implemented in the fabrication of sensors, 32 microsupercapacitors, 33,34 and gas separation membranes.…”
Section: Introductionmentioning
confidence: 99%
“…Vapor-phase growth of MOFs is a rapidly expanding area, 20 as illustrated by reports on the deposition of ZIF-67, 21 CuBDC, 22 CuCDC, 22 HKUST-1, 23 and a Zn-carboxylate-pyrazolate MOF-5 isotype structure. 24 Furthermore, related approaches have been developed such as CVD of amorphous precursors followed by postdeposition crystallization to form MOF-5, 25 IRMOF-8, 26 UiO-66, 27 and UiO-66-NH 2 28 and the deposition of crystalline coordination compounds (e.g., MAF-252, 29 CaBDC, 30 and different CuBDC polymorphs 22,31 ). Moreover, MOF-CVD has been successfully implemented in the fabrication of sensors, 32 microsupercapacitors, 33,34 and gas separation membranes.…”
Section: Introductionmentioning
confidence: 99%
“…Vapor-phase growth of MOFs is a rapidly expanding area, 20 as illustrated by reports on the deposition of ZIF-67, 21 CuBDC, 22 CuCDC, 22 HKUST-1, 23 and a Zn-carboxylate-pyrazolate MOF-5 isotype structure. 24 Furthermore, related approaches have been developed such as CVD of amorphous precursors followed by postdeposition crystallization to form MOF-5, 25 IRMOF-8, 26 UiO-66 27 and UiO-66-NH2 28 , and the deposition of crystalline coordination compounds (e.g., CaBDC 29 , different CuBDC polymorphs 22,30 ). Moreover, MOF-CVD has been successfully implemented in the fabrication of sensors, 31 microsupercapacitors 32,33 and gas separation membranes.…”
Section: Introductionmentioning
confidence: 99%
“…The MAF‐6 has bigger pores than ZIF‐8, which is applicable for adsorbing large molecules . There also have been trials of preparing the initial metal oxide layers in various ways, such as ZnO layers grown by CVD for the growth of MOF‐5 type thin films and CuO layers grown by PVD for the growth of various Cu‐based MOF thin films …”
Section: Cvd‐based Gas‐phase Mof Thin Film Growthmentioning
confidence: 99%
“…The MAF-6 has bigger pores than ZIF-8, which is applicable for adsorbing large molecules. [40] There also have been trials of preparing the initial metal oxide layers in various ways, such as ZnO layers grown by CVD for the growth of MOF-5 type thin films [41] and CuO layers grown by PVD for the growth of various Cu-based MOF thin films. [42] Ma et al [38] also applied an analogous ZIF-8 growth method to the growth of ZIF-8 membranes by transforming ZnO layers that had been deposited on permeable Al 2 O 3 substrates, which is schematically described in Figure 3a.…”
Section: Cvd-based Gas-phase Mof Thin Film Growthmentioning
confidence: 99%