2013
DOI: 10.1016/j.tsf.2012.12.054
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Fabrication of ultrathin films of Ta2O5 by a sol–gel method

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Cited by 20 publications
(6 citation statements)
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References 26 publications
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“…(E) Higher-magnification filtered image of the previous region and related power spectrum. Reproduced with permission from ref . Copyright 2013 Elsevier.…”
Section: Synthesis Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…(E) Higher-magnification filtered image of the previous region and related power spectrum. Reproduced with permission from ref . Copyright 2013 Elsevier.…”
Section: Synthesis Methodsmentioning
confidence: 99%
“…Researchers have successfully produced Ta 2 O 5 thin films using sol–gel methods, with different starting materials and calcination temperatures affecting the film’s amorphous or crystalline nature (Figure ). …”
Section: Synthesis Methodsmentioning
confidence: 99%
“…After that, the precursor solution was continuously stirred until achieving a yellow transparent TiO 2 -Ta 2 O 5 sol. The mixture was hydrolyzed without any further water addition at room temperature under stirring for 2.0 h [38][39][40].…”
Section: Preparation Of (50 %)Er 3+ :Y 3 Al 5 O 12 / Pt-(tio 2 -Ta 2mentioning
confidence: 99%
“…Among these coatings, tantalum oxide (Ta x O y ) film has recently attracted much attention due to its advantages such as excellent corrosion resistance, good biocompatibility, and good wear resistance, as well as its ability to inhibit the growth of bacteria [18,19,20,21]. At present, various techniques for preparing Ta x O y film have been reported, including magnetron sputtering [18,19,20,21,22], liquid phase deposition (LPD) [23,24], electrochemical deposition [25], pulsed laser deposition (PLD) [26], atomic layer deposition (ALD) [27] and sol-gel method [28,29]. It is pointed out that the magnetron sputtering, with thus fabricated films’ characteristics of high density and uniformity, high strong adhesion, low processing temperature, and easy-controlling film structure/composition, will be the ideal techniques for Ta x O y films preparation [30,31].…”
Section: Introductionmentioning
confidence: 99%