Fabrication of ultra-thin si nanopillar arrays for polarization-independent spectral filters in the near-IR

Abstract

Sub-wavelength arrays have garnered significant interest for many potential optoelectronics applications. We fabricated sub-wavelength silicon nanopillar arrays with a ratio of radius, r and a center-to-center distance, a, of r/a ≈ 0.2 that were fully embedded in SiO 2 for narrow stopband filters that are compact and straightforward to fabricate compared to conventional Bragg stack reflectors. These arrays are well-suited for hyperspectral filtering applications in the infrared. They are ultra-thin (<0.1λ), polarization-independent, and attain greater efficiencies enabled by low loss compared to plasmonic-based designs. The choice of Si as the nanopillar material stems from its low cost, high index of refraction, and a band gap of 1.1 eV near the edge of the visible. These arrays exhibit narrow near-unity reflectivity resonances that arise from coupling of an incident wave into a leaky waveguide mode via a grating vector that is subsequently reradiated, also known as guided mode resonances (GMRs). Simulations reveal reflectivities of >99% with full width at half maxima (FWHM) of ≈0.01 μm. We demonstrate a fabrication route for obtaining nanopillar arrays that exhibit these GMRs. We experimentally observed a GMR with an amplitude of ~0.8 for filter arrays fabricated on silicon on insulator (SOI) substrates, combined with Fabry-Perot interference that stems from the underlying silicon layer.