Fabrication of three-dimensional photonic crystals with multilayer photolithography

Abstract

We have developed a new approach for the fabrication of three-dimensional (3D) photonic crystals based on multilayer 3D photolithography. This method, which uses commercially available photoresist, allows batch fabrication of 3D photonic crystals (PhCs), possesses the flexibility to create a variety of different lattice arrangements, and provides the freedom for arbitrary defect introduction. We describe in this paper how planar lithography is modified to achieve 3D confined exposure and multiple resist application. We demonstrated the fabrication of multilayer "woodpile" structures with and without engineered defects. We further infiltrated the resist template using a higher-index material and obtained the inverse 3D PhC structure.

Double-Exposure Grayscale Photolithography

“…For example, the phase Fresnel lens in [12] can be realized as a phase zone plate using only planar technology, but it will have a diminished efficiency compared to a 3D phase Fresnel lens. Other applications of 3D photolithography include microfluidics [13] for microchannels, microsurgical tools [14], and photonic crystals [15].…”

“…Several groups have presented multiple-step photolithography fabrication with positive photoresist [18] and negative photoresist with applications in microfluidic channels [13] and photonic crystals [15]. The photoresist is treated with a binary exposure pattern using a dose at or below the clearing dose.…”

Moiré-Based Phase Imaging for Sensing and Adjustment of In-Plane Twist Angle

“…In particular, proximity photolithography, x-ray lithography and nanoimprint lithography have proven to be valuable tools to fabrication of wide varieties of optoelectronic and electronic devices, such as the master or mold fabrication in soft lithography [1], direct surface prototyping for Lab-on-a-chip (LOC) devices [2], [3], optical fabrication for micro optical components [4], [5] and photonic crystal [6], [7], etc. Hereinto, one of the most important steps is the detecting and adjusting in-plane twist angle during optical alignment of wafer and mask.…”

Synthesis optimization of photonic crystals based on silicon and vanadium dioxides

“…The works on photonic crystals are motivated by a number of promising applications, such as high-performance light emitting diodes, lowthreshold lasers, optical waveguides with sharp bends and optical microchips. Nowadays there are numerous approaches to the creation of PC by using the lithography [2], interferential holography [3] and self-assembly of colloidal particles [4]. One of the first materials that have been considered as photonic crystals were synthetic opals, consisting of close-packed spherical particles of silica.…”