2004
DOI: 10.1116/1.1761460
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Fabrication of three-dimensional microstructures by two-dimensional slice by slice approaching via focused ion beam milling

Abstract: Articles you may be interested inInvestigation of etching two-dimensional microhole lattice array on lithium niobate with focused ion beam for fabricating photonic crystals

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Cited by 45 publications
(17 citation statements)
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“…To evaluate the influence of the overlap effect under such condition the ion current was kept at 1 nA as that used in the above experiments. The variation rate of the ion dose is around 1.4 × 10 13 ions/ms as shown in Fig. 7.30b.…”
Section: Optimisation Of the Divergence Compensation Methodsmentioning
confidence: 89%
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“…To evaluate the influence of the overlap effect under such condition the ion current was kept at 1 nA as that used in the above experiments. The variation rate of the ion dose is around 1.4 × 10 13 ions/ms as shown in Fig. 7.30b.…”
Section: Optimisation Of the Divergence Compensation Methodsmentioning
confidence: 89%
“…Redeposition effect and the influence of the scanning path were ignored. Fu et al [13] employed a two-dimensional slice-by-slice method to fabricate threedimensional structures by FIB. Sequential two-dimensional slices with small thicknesses were used to approach the desired three-dimensional structures.…”
Section: Determination Of Fabrication Parameters In Fib Machiningmentioning
confidence: 99%
“…Focused ion beam direct writing method is found to be effective in MOE fabrication. Two-dimensional slice-by-slice approaching can be employed to facilitate three-dimensional micro optical elements' fabrication, including micro-diffraction lens and micro hybrid refractive--diffractive lens (Fu and Bryan 2004a), as shown in Fig. 15.…”
Section: Micro Optical Elementsmentioning
confidence: 99%
“…However, a method for the accurate fabrication of material surfaces is still a challenge for various applications. Several remarkable efforts have been made to achieve those goals, including the Slice by Slice approach of Y. Fu et al [10,11], the approach of variable pixel dwell time over the sample surface by Adams and Vasile et al [12,13], and the Simulation based method, hereafter simply SBM, by Kim et al [14,15]. In the former two efforts, redeposition flux that is generated during the sputter process was not considered, while in the latter redeposition flux is automatically included during the simulation process.…”
Section: Introductionmentioning
confidence: 99%