2011
DOI: 10.1299/jmmp.5.891
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Fabrication of Textured DLC Films Using Three-Dimensional Masking System

Abstract: Segment-structured diamond-like carbon (S-DLC) film, which is separated DLC films into small segments using metal mask, has been developed in order to improve its tribological property or accomplish multi-functionalized surface. Meanwhile, the S-DLC deposition by conventional methods using metal mesh as masks is difficult to apply to the three-dimensional substrates which have complicate curves. The purpose of this study is to develop coating methods for S-DLC deposition on the three-dimensional substrates lik… Show more

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Cited by 3 publications
(3 citation statements)
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“…Due to their potential tribological applications, segment-structured surfaces have drawn much attention in recent years [16]. It is well known that the patterning of tribological coatings can further enhance the wear performance of an engineering surface.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Due to their potential tribological applications, segment-structured surfaces have drawn much attention in recent years [16]. It is well known that the patterning of tribological coatings can further enhance the wear performance of an engineering surface.…”
Section: Introductionmentioning
confidence: 99%
“…However, increasing tribological demands of modern industries has pushed the segmented DLC film development to its limits. Furthermore, the fabrication of small segments using metal meshes as masks is difficult to apply on three-dimensional substrate shapes, and complex and costly procedures are needed [1, 4, 6]. To overcome these limitations, it may be possible to obtain a quasi-patterned surface by introducing porosity, which can have a tribological function similar to that of the segmented surfaces described above.…”
Section: Introductionmentioning
confidence: 99%
“…The other is a mask process. The former method includes photolithography (Petterson and Jacobson, 2004) (Zhao, et al, 2013) and laser beam methods (Ding, et al, 2011), whereas the latter process includes a photolithography (Chouquet et al, 2010), a nanoimprinting, a mesh masking (Aoki and Ohtake 2004) and an inkjet method (Takashima, et al, 2011). With the exception of mesh masking, these methods are usually used for micromachining of electronic devices.…”
Section: Introductionmentioning
confidence: 99%