Fabrication of smooth Al nanolayers at different temperatures

Stefaniuk, Tomasz; Wróbel, Piotr; Ciesielski, Arkadiusz; Szoplik, Tomasz

doi:10.1109/icton.2013.6602895

Cited by 2 publications

(2 citation statements)

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“…31 To improve the film quality, efforts have been made by optimizing the thermal evaporation conditions. 32,33 However, the random orientation and boundaries of crystal grains in the multicrystalline aluminum film still hamper the fabrication precision and product yield. This is because, in multicrystalline metallic films, randomly oriented crystal grains lead to variation in the resistance to the ion-beam milling process.…”

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confidence: 99%

“…The low film quality makes it very difficult to fabricate complex nanocircuits containing multiple circuit elements and greatly limits the application of aluminum, for example, in plasmonic nanolasers, which requires an ultrasmooth surface of metallic film . To improve the film quality, efforts have been made by optimizing the thermal evaporation conditions. , However, the random orientation and boundaries of crystal grains in the multicrystalline aluminum film still hamper the fabrication precision and product yield. This is because, in multicrystalline metallic films, randomly oriented crystal grains lead to variation in the resistance to the ion-beam milling process.…”

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Single-Crystalline Aluminum Nanostructures on a Semiconducting GaAs Substrate for Ultraviolet to Near-Infrared Plasmonics

Liu

Lin

et al. 2015

ACS Nano

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Aluminum, as a metallic material for plasmonics, is of great interest because it extends the applications of surface plasmon resonance into the ultraviolet (UV) region and is superior to noble metals in natural abundance, cost, and compatibility with modern semiconductor fabrication processes. Ultrasmooth single-crystalline metallic films are beneficial for the fabrication of high-definition plasmonic nanostructures, especially complex integrated nanocircuits. The absence of surface corrugation and crystal boundaries also guarantees superior optical properties and applications in nanolasers. Here, we present UV to near-infrared plasmonic resonance of single-crystalline aluminum nanoslits and nanoholes. The high-definition nanostructures are fabricated with focused ion-beam milling into an ultrasmooth single-crystalline aluminum film grown on a semiconducting GaAs substrate with a molecular beam epitaxy method. The single-crystalline aluminum film shows improved reflectivity and reduced two-photon photoluminescence (TPPL) due to the ultrasmooth surface. Both linear scattering and nonlinear TPPL are studied in detail. The nanoslit arrays show clear Fano-like resonance, and the nanoholes are found to support both photonic modes and localized surface plasmon resonance. We also found that TPPL generation is more efficient when the excitation polarization is parallel rather than perpendicular to the edge of the aluminum film. Such a counterintuitive phenomenon is attributed to the high refractive index of the GaAs substrate. We show that the polarization of TPPL from aluminum preserves the excitation polarization and is independent of the crystal orientation of the film or substrate. Our study gains insight into the optical property of aluminum nanostructures on a high-index semiconducting GaAs substrate and illustrates a practical route to implement plasmonic devices onto semiconductors for future hybrid nanodevices.

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confidence: 99%