Infrared Technology and Applications XLIII 2017
DOI: 10.1117/12.2267879
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Fabrication of small pitch, high definition (HD) 1kx2k/5μm MWIR focal-plane-arrays operating at high temperature (HOT)

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Cited by 6 publications
(4 citation statements)
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“…IR III-V barrier detector MWIR FPAs with 2k × 2k/10 μm and 2k × 1k/5 μm formats have been demonstrated by developing high aspect ratio dry etching for mesa delineation (FF > 80%) (see figure 59), proper device passivation by dielectric layer and high aspect ratio indium bump schemes (operability > 99.9%). The observed dark current densities indicated that the detector material did not degrade during the epitaxial transfer and subsequent wafer-scale fabrication process [138]. Resulting hybrids operating at 150 K show low NEDT (<20 mK at 150 K using f /2.3 optics), and high operability for both 5 μm and 10 μm pixels.…”
Section: Novel Iii-v Arrays Based On Type-ii Superlatticesmentioning
confidence: 94%
“…IR III-V barrier detector MWIR FPAs with 2k × 2k/10 μm and 2k × 1k/5 μm formats have been demonstrated by developing high aspect ratio dry etching for mesa delineation (FF > 80%) (see figure 59), proper device passivation by dielectric layer and high aspect ratio indium bump schemes (operability > 99.9%). The observed dark current densities indicated that the detector material did not degrade during the epitaxial transfer and subsequent wafer-scale fabrication process [138]. Resulting hybrids operating at 150 K show low NEDT (<20 mK at 150 K using f /2.3 optics), and high operability for both 5 μm and 10 μm pixels.…”
Section: Novel Iii-v Arrays Based On Type-ii Superlatticesmentioning
confidence: 94%
“…The robustness of the material, the ability to operate almost in entire infrared region of T2SL technology are likely to challenge its competitor MCT from cost and performance point of view especially for dual-band or large format arrays [6][7][8][9] .…”
Section: Introductionmentioning
confidence: 99%
“…While these configurations aim to minimize surface leakage currents and maximize the fill factor by not exposing the mesa sidewalls with an interpixel trench, not fully delineating the pixel penalizes the MTF values mainly due to high electrical crosstalk [6], [12], [13]. However, state-of-the-art MWIR T2SL detectors implement a fully delineated geometry with appropriate passivation of the mesa sidewalls to suppress surface leakage currents [14], [15]. In addition, thanks to this geometry, optical concentration in the pixel has been observed as the pixel pitch reduces, thus mitigating the fill factor loss due to the trench etching and increasing the signal-to-noise ratio in smaller pixel size [7], [16], [17].…”
mentioning
confidence: 99%