Fabrication of size-tunable, periodic Si nanohole arrays by plasma modified nanosphere lithography and anisotropic wet etching

Cheng, Sheng-Tzong; Lin, Y.H.; Lee, S.W.; Lee, T.; Chen, H.; Hu, Jiumei; Chen, L.T.

doi:10.1016/j.apsusc.2012.09.073

Cited by 15 publications

(5 citation statements)

References 23 publications

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“…Black silicon light trapping structures, including nanowires [1] [2] and nanoholes [3] [4], have demonstrated their excellent anti-reflectance properties, providing the opportunities for enhancing light-harvesting. However, despite of the superior light absorption enhancement, the efficiency of textured silicon solar cells remains relatively low compared to those of conventional c-Si solar cells.…”

Section: Introductionmentioning

confidence: 99%

New Procedure to Obtain Specific and High Absorbent Silicon Nanotextures: Inverted Pyramids, Cubic Nano-Microholes, Spiroconical Nano-Microholes and Rhombohedral-Stared Nanosheet Bouquets (Nanobuckets)

Fall¹,

Toure²,

Ndioukane³

et al. 2021

JMP

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The present work relates to a process for silicon surface texturing for preparing large-area, silicon nanotextures on silicon substrates at ambient temperature by assisted chemical etching. A novel strategy comprises of two fundamental steps (metal-assisted chemical etching (MACE) and solution post-treatment) of using the silver catalyst to obtain specific nano-or micro-textures. The strategy is based on metal-induced (Ag) local oxidation and dissolution of a silicon substrate in three different concentrations of aqueous fluoride solution with the post-treatment solution. The etching technique is dependent on the etching time and concentration of aqueous fluoride solution. Therefore, detailed scanning electron microscopy observations reveal specifics shapes as inverted pyramids, cubic nano-microholes, spiroconical nano-microholes and rhombohedral-stared nanosheet bouquets (called Nanobukets), obtained for the first time on a (100) silicon surface by this new variant of the MACE method named Double Etching Method (DEM). Silicon nanostructures are used in many nanotechnology applications such as nano-microelectronics, optoelectronics or biomedical applications. UV-Visible spectrometry measurements carried out made it possible to obtain the lowest reflectance and highest absorbance values who are 3% and 97%, respectively for the rhomboedral-stared nanosheet bouquets on (100) crystalline silicon substrates in the UV-visible-NIR wavelength range from 300 to 1200 nm.

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Section: Introductionmentioning

confidence: 99%

New Procedure to Obtain Specific and High Absorbent Silicon Nanotextures: Inverted Pyramids, Cubic Nano-Microholes, Spiroconical Nano-Microholes and Rhombohedral-Stared Nanosheet Bouquets (Nanobuckets)

Fall¹,

Toure²,

Ndioukane³

et al. 2021

JMP

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“…[6][7][8][9] Moreover, for metal-assisted wet etching, metal contamination, which would be fatal for the integration, would be induced. [10][11][12][13] In addition to this, owing to the strong oxidation potential of the etching solution, the wet etching time is very short and it is difficult to achieve a precise surface modification. For traditional reactive ion etching, the etching process is usually under extreme conditions, such as a low temperature.…”

Section: Introductionmentioning

confidence: 99%

Formation of ultralow-reflectance silicon surface by dry etching

Zhang¹,

Yang²,

He³

et al. 2015

Jpn. J. Appl. Phys.

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In this study, a one-step method of fabricating nano to micro structures was reported. Monte Carlo (MC) simulation and a fluid equation were employed to study the formation and evolution mechanism. To verify the fundamental simulation and hypothetical mechanism, standard surface technology (STS) was used with a phase delay producer to build the etching system. Also, throughout the practical experiment, the relationship between the structure scale and the process parameter was recorded. Lastly, the reflectance was measured to be only 0.9%, proving that this method was very promising for optical application.

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“…More importantly low grade Si raw materials can be utilized when combining the nanostructures arrays, as light trapping and carrier collection can be decoupled [1,2], which is beneficial to lower the manufacturing cost. The enhanced light absorption of Si nanostructures arrays have been demonstrated both theoretically and experimentally, such as nanowire [3][4], nanohole [5][6][7][8][9], and nanocone [10][11][12][13][14] arrays. However, after introducing the high aspect ratio associated with silicon nanowire [3][4] and nanohole [5][6][7][8][9] arrays, conformal deposition of the transparent electrodes over the nanostructure surface for efficient photo-generated carrier collection becomes challenging, resulting in low power conversion efficiencies.…”

Section: Introductionmentioning

confidence: 99%

“…In addtion, the general choice for fabricating SiHNH arrays was as following, firstly, the Si film with metal hexagonal nanohole arrays as mask can be obtained using nanosphere lithography explored previously [8]. Finally, the SiHNH arrays were formed by Si etching via reactive ion etching [10,13] and removing the metal mask.…”

Section: Introductionmentioning

confidence: 99%

Effect of hexagonal nanoconical hole arrays based solar cells on the light absorption enhancement

Ding

Wangyang

et al. 2014

2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3m-Nano)

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The optical properties of the silicon hexagonal nanoconical hole (SiHNH) arrays based solar cells is systematically studied via simulation based on Rigorous Coupled Wave Analysis (RCWA) and Modal Transmission Line (MTL) theory. An ultimate efficiency of the optimized SiHNH arrays based solar cell is up to 31.92%, 4.52% higher than that of silicon hexagonal nanoconical frustum (SiHNF) arrays. The absorption enhancement of the SiHNH arrays is due to its lower reflectance and more supported guided-mode resonances, and the enhanced ultimate efficiency is insensitive to bottom diameter (D bot ) of nanoconical hole and the incident angle. The result provides an additional guideline for the nanostructure surface texturing fabrication design for photovoltaic applications.

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Fabrication of size-tunable, periodic Si nanohole arrays by plasma modified nanosphere lithography and anisotropic wet etching

Cited by 15 publications

References 23 publications

New Procedure to Obtain Specific and High Absorbent Silicon Nanotextures: Inverted Pyramids, Cubic Nano-Microholes, Spiroconical Nano-Microholes and Rhombohedral-Stared Nanosheet Bouquets (Nanobuckets)

New Procedure to Obtain Specific and High Absorbent Silicon Nanotextures: Inverted Pyramids, Cubic Nano-Microholes, Spiroconical Nano-Microholes and Rhombohedral-Stared Nanosheet Bouquets (Nanobuckets)

Formation of ultralow-reflectance silicon surface by dry etching

Effect of hexagonal nanoconical hole arrays based solar cells on the light absorption enhancement

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