Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch<sup>−2</sup>

Xu, Jianzhong; Hong, Sung Woo; Gu, Wenhua; Lee, Kim Y.; Kuo, David; Xiao, Shuaigang; Russell, Thomas P.

doi:10.1002/adma.201102964

Cited by 33 publications

(36 citation statements)

References 34 publications

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“…We suggest that acoustic cavitation generates free radicals for bond cleavage of the PS-PEO. Generally, weak and strong acids are used for reconstruction or etching of these systems3536. Here, ethanol was preferred as an etching solvent because of its' vapour pressure, selected solubility into PEO (since they have similar solubility parameters) and chemistry.…”

Section: Discussionmentioning

confidence: 99%

Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application

Ghoshal

Maity²,

Senthamaraikannan

et al. 2013

Sci Rep

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Highly dense hexagonally arranged iron oxide nanodots array were fabricated using PS-b-PEO self-assembled patterns. The copolymer molecular weight, composition and choice of annealing solvent/s allows dimensional and structural control of the nanopatterns at large scale. A mechanism is proposed to create scaffolds through degradation and/or modification of cylindrical domains. A methodology based on selective metal ion inclusion and subsequent processing was used to create iron oxide nanodots array. The nanodots have uniform size and shape and their placement mimics the original self-assembled nanopatterns. For the first time these precisely defined and size selective systems of ordered nanodots allow careful investigation of magnetic properties in dimensions from 50 nm to 10 nm, which delineate the nanodots are superparamagnetic, well-isolated and size monodispersed. This diameter/spacing controlled iron oxide nanodots systems were demonstrated as a resistant mask over silicon to fabricate densely packed, identical ordered, high aspect ratio silicon nanopillars and nanowire features.

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Section: Discussionmentioning

confidence: 99%

Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application

Ghoshal

Maity²,

Senthamaraikannan

et al. 2013

Sci Rep

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“…H 2 O condensed exclusively in the PEO domains after an immersion of the PS-b-PEO BCP in water, which selectively reacts with SiCl 4 or TiCl 4 to generate SiO 2 or TiO 2 posts. A PDMS homopolymer, another precursor for SiO x , was used to fabricate silicon oxide pillars [77]. A thin layer of PDMS in heptane was spin-coated onto a porous PS-b-PEO template.…”

Section: (A) Ps-b-pi and Ps-b-pbmentioning

confidence: 99%

Pattern transfer using block copolymers

Gunkel

Russell

2013

Phil. Trans. R. Soc. A.

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To meet the increasing demand for patterning smaller feature sizes, a lithography technique is required with the ability to pattern sub-20 nm features. While top-down photolithography is approaching its limit in the continued drive to meet Moore's law, the use of directed self-assembly (DSA) of block copolymers (BCPs) offers a promising route to meet this challenge in achieving nanometre feature sizes. Recent developments in BCP lithography and in the DSA of BCPs are reviewed. While tremendous advances have been made in this field, there are still hurdles that need to be overcome to realize the full potential of BCPs and their actual use.

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“…Afterward several authors reported the possibility to fabricate high-density metal nanodots using similar procedures (Jeong et al 2008;Hong et al 2010;Xiao et al 2005). Similarly, many authors explored the possibility to form amorphous SiO 2 nanodots using block copolymer thin films as a template (Park et al 2008;Xu et al 2011). Guarini and coworkers fabricated Si nanocrystal arrays for non-volatile memory applications using self-assembled block copolymers as an etch mask to pattern the underlying SiO 2 substrate and then used this nanoporous hard mask for the deposition of amorphous Si (a-Si) nanodots (Guarini et al 2003).…”

Section: Introductionmentioning

confidence: 97%

Silicon crystallization in nanodot arrays organized by block copolymer lithography

Perego¹,

Andreozzi²,

Seguini³

et al. 2014

J Nanopart Res

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Asymmetric polystyrene-b-polymethylmethacrylate (PS-b-PMMA) block copolymers are used to fabricate nanoporous PS templates with different pore diameter depending on the specific substrate neutralization protocol. The resulting polymeric templates are used as masks for the subsequent deposition of a thin (h = 5 nm) amorphous Si layer by electron beam evaporation. After removal of the polymeric film and of the silicon excess, well-defined hexagonally packed amorphous Si nanodots are formed on the substrate. Their average diameter (d \ 20 nm), density (1.2 9 10 11 cm -2 ), and lateral distribution closely mimic the original nanoporous template. Upon capping with SiO 2 and high temperature annealing (1050°C, N 2 ), each amorphous Si nanodot rearranges in agglomerates of Si nanocrystals (d \ 4 nm). The average diameter and shape of these Si nanocrystals strongly depend on the size of the initial Si nanodot.

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Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch⁻²

Cited by 33 publications

References 34 publications

Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application

Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application

Pattern transfer using block copolymers

Silicon crystallization in nanodot arrays organized by block copolymer lithography

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Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch−2

Cited by 33 publications

References 34 publications

Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application

Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application

Pattern transfer using block copolymers

Silicon crystallization in nanodot arrays organized by block copolymer lithography

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Product

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Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch⁻²