Fabrication of silica nanopillars by templated etching using bimetallic nanoparticles for anti-reflection applications

Combined experimental and simulation study of self-assembly of colloidal gold nanoparticles on silanized glass

“…6 It was reported that a monolayer of metal NPs (deposited on a silica substrate by thermal evaporation followed by annealing) was also used as an etchant mask for the fabrication of silica nanopillars for anti-reflection coatings. 28 The deposition of a self-assembled monolayer of chemically synthesized metal NPs could replace the thermal evaporation and annealing processes and act as an etchant mask. However, the antireflection properties of the fabricated microstructures depend on the design parameters of the silica nanopillars such as the diameter, cross-sectional area, and areal density on the substrate.…”

Electron beam evaporated Au islands as a nanoscale etch mask on few-layer MoS2 and fabrication of top-edge hybrid contacts for field-effect transistors

“…While electron beam lithography can enable patterning down to the 10s of nm regime, self-assembly of shapes, patterns, or particles can be incredibly useful, as it reduces the number of processing steps, the possibility for contamination, and may even improve accuracy in creating the pattern. Recently, the dewetting of less reactive metals, typically in columns VIII or IB of the periodic table (i.e., Fe [15], Ni [16] [17], Cu [18], Pd, Ag [19] [20] [21], Pt [22] [20], or Au [23] [24] [25]) has been exploited to create nanoscale patterns on various substrates relevant to nanoelectronics, including SiO2 [22] [23] [24] [25] [19] [20] [18], Si3N4 [16], Al2O3 [26], GaN [16], and InGaN [17]. Dewetting of Ag on MoS2 also allows for the creation of adjacent pairs of islands for surface enhanced Raman scattering (SERS) [27].…”

Effect of nanoparticles on the dewetting of bismuth films

“…Dewetting is normally considered detrimental as it limits the thermal stability of films [5]. There are also applications, primarily to synthesize nanoparticle arrays by dewetting, with or without patterning [6][7][8][9][10][11][12][13][14][15]. Recently, we had reported on the synthesis of Cu-Ag bimetallic nanoparticles, by solid-state dewetting, which were used as etch masks to fabricate dual-diameter silica nanopillars for antireflection coating applications.…”

“…Recently, we had reported on the synthesis of Cu–Ag bimetallic nanoparticles, by solid-state dewetting, which were used as etch masks to fabricate dual-diameter silica nanopillars for antireflection coating applications. The nanopillars grown from these bimetallic nanoparticles showed lower reflectivity when compared with pillars obtained from monometallic particles [13].…”