Fabrication of Polymer and Metal Three-Dimensional Micromesh Structures

Sato, Hiroki; Houshi, Y.; Otsuka, Toshiharu; Shoji, Shuichi

doi:10.1143/jjap.43.8341

Cited by 7 publications

(6 citation statements)

References 2 publications

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“…The fabrication methods of the 3-D micromesh Ni structures were developed by modifying the multi-angle exposure of UV photpresist [11][12][13]. An inverse-micromesh frame was fabricated by multiple inclined backside exposures, and Ni was electroplated using the inverse-micromesh frame as a mold (Fig.…”

Section: Comb-shaped 3-d Micromesh Metal Electrodesmentioning

confidence: 99%

Micro/Nano Fabrication Technologies and Micro Flow Devices for Future Energy Devices

Shoji

Ishizuka

Sato

et al. 2009

Nanostructure Science and Technology

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Section: Comb-shaped 3-d Micromesh Metal Electrodesmentioning

confidence: 99%

Micro/Nano Fabrication Technologies and Micro Flow Devices for Future Energy Devices

Shoji

Ishizuka

Sato

et al. 2009

Nanostructure Science and Technology

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“…Previously, we reported the fabrication method of the 3-D micromesh Ni structures [1] [2]. An inversemicromesh frame was fabricated by multiple inclined backside exposures, and Ni was electroplated using the inverse-micromesh frame as a mold (fig.…”

Section: Comb-shaped 3-d Micromesh Electrodesmentioning

confidence: 99%

Fabrication of Comb-Shaped 3-D Micromesh Ni Electrodes

Otsuka,

Sato,

Shoji

2006

Meet. Abstr.

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“…For example, greyscale electron beam lithography can generate 3D profiles by applying a varied dose [1,2]. X-ray lithography and ultraviolet (UV) lithography can fabricate 3D structures by using a moving photomask (moving mask x-ray [3,4] and UV lithography [5]), using a greyscale photomask (greyscale x-ray [6] and UV lithography [7,8]), or by tilting and rotating the sample stage and UV light (inclined/rotated x-ray [9,10] and UV lithography [11][12][13][14][15][16]). Focused ion beam lithography can manufacture 3D structures by direct milling [17] or atomic implantation [18].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of circular sawtooth gratings using focused UV lithography

Karlsson

Holmberg

et al. 2016

J. Micromech. Microeng.

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This paper presents a novel micro-fabrication method using focused ultraviolet (UV) light to manufacture three-dimensional sawtooth structures in ultra-thick negative photoresist to fabricate a novel multi-prism x-ray lens. The method uses a lens to shape the UV beam instead of the photomask conventionally used in UV lithography. Benefits of this method include the ability to manufacture sawtooth structures in free form, for example in circular shapes as well as arrays of these shapes, and in resist that is up to 76 μm thick. To verify the method, initially a simple simulation based on Fourier optics was done to predict the exposure energy distribution in the photoresist. Furthermore, circular sawtooth gratings were manufactured in a 76 μm SU-8 resist. The UV lens was fabricated using electron beam lithography and then used to expose the SU-8 with UV light. This paper details the complete developed process, including pre-exposure with an e-beam and cold development, which creates stable sawtooth structures. The measured profile was compared to the ideal sawtooth and the simulation. The main discrepancy was in the smallest feature size, the sawtooth tips, which were wider than the desired structures, as would be expected by simulation.

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Fabrication of Polymer and Metal Three-Dimensional Micromesh Structures

Cited by 7 publications

References 2 publications

Micro/Nano Fabrication Technologies and Micro Flow Devices for Future Energy Devices

Micro/Nano Fabrication Technologies and Micro Flow Devices for Future Energy Devices

Fabrication of Comb-Shaped 3-D Micromesh Ni Electrodes

Fabrication of circular sawtooth gratings using focused UV lithography

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