2010
DOI: 10.1109/tmag.2010.2048748
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Fabrication of Planarized Discrete Track Media Using Gas Cluster Ion Beams

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Cited by 21 publications
(7 citation statements)
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“…Furthermore, N 2 GCIB is a candidate finishing process because it can planarize the surface roughness with small wavelength. 14…”
Section: Resultsmentioning
confidence: 99%
“…Furthermore, N 2 GCIB is a candidate finishing process because it can planarize the surface roughness with small wavelength. 14…”
Section: Resultsmentioning
confidence: 99%
“…In this case, no effort was made to improve the roughness by applying, for instance, a planarizing film and sequential angled IBE under a large angle. 78,79 The difficulty in implementing such planarization steps would be to find a polymer coating that is not too thick but shows a good step-coverage. Additionally, tn the cited works, Ra roughness values of a few nanometers were reduced to several angstroms, however, considering significant etch depths of 300 nm.…”
Section: Au Hollow Nanopillars Composition and Morphologymentioning
confidence: 99%
“…A potential way to solve the problems associated with the patterned topography of BPM is to planarize the BPM disk surface [99]- [101]. This may be accomplished by depositing an appropriate material to fill the grooves between the patterned bits, and then removing the excess fill material on the islands so that the final disk surface has a roughness comparable to conventional continuous media.…”
Section: A Head-disk Interfacementioning
confidence: 99%