Fabrication of parallel-plate nanomirror arrays for extreme ultraviolet maskless lithography

Abstract

A micromirror array for extreme ultraviolet (EUV) maskless lithography was designed and fabricated. The arrays are composed of devices with less than a 350 nm actuation gap and a surface area ranging from 1 μm2 to 20 μm2. The mirror layer is composed of silicon in lieu of the Mo/Si stack used for EUV mirrors in order to debug the process and to simplify the initial fabrication. Germanium was used as a sacrificial material while α-Si acts as a hinge for this parallel-plate design. Silicon migration into germanium was observed, so the thermal budget was restrained to 450 °C for the entire process. Scanning electron microscope images of working devices are provided.

Planar Gold Nanoparticle Clusters as Microscale Mirrors

“…5 Virtually all micromirrors are fabricated lithographically from metal-coated or uncoated silicon. 1,4,5 In extension of our work on nanoparticle-based waveguides, [6][7][8][9] we report here a scalable chemical synthesis of micrometer-scale mirrors based on Au nanoparticles and Ca 2 Nb 3 O 10 nanoplates. Similar to their macroscale analogues, these nanoparticle mirrors (NMs) are capable of directional light reflection.…”

“…Miniaturized mirrors, which are among the simplest waveguiding devices, are employed in spatial light modulators, 1,2 in optical switches, 3,4 and as light-emitting devices in commercial projection displays. 5 Virtually all micromirrors are fabricated lithographically from metal-coated or uncoated silicon.…”

Optical processing of bacterial libraries for directed evolution

“…Projection devices such as micro-mirror arrays or laser scanning systems can rapidly pattern with several-micron resolution using a variety of light sources (Becker et al, 1997;Chan et al, 1998;Paufler et al, 2001;Singh-Gasson et al, 1999). Mirror arrays for patterning at a sub-0.1 Am resolution are theoretically feasible, and under development (Choski et al, 1999;Schroff et al, 2001). Alternatively, high-resolution scanning laser systems could be used.…”

A Review On Variable MEMS Mirrors For Photo-Lithographic Masks

“…Preliminary fabrication results are achieved, however, they are still trying to solve some fabrication problems of the nano-scale structure. The proposed area of the mirror element ranges from 0.25 to 2 µm 2 [15,16].…”