Fabrication of ordered nanospheres using a combination of nanoimprint lithography and controlled dewetting

Schleunitz, Arne; Spreu, Christian; Lee, Jaejong; Schift, Helmut

doi:10.1116/1.3498762

Cited by 5 publications

(3 citation statements)

References 11 publications

(13 reference statements)

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“…This journal is © The Royal Society of Chemistry 2015 occurs due to the increased surface energy in the metal lm by heating. 39,40 The dewetting results are shown in Fig. 2A-C.…”

Section: Resultsmentioning

confidence: 99%

Fabrication of biomimetic patterns for high transmission and antifogging property

Xü

Liu

et al. 2015

RSC Adv.

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Enhancing the transmission of optical components is important for improving the performance of optical and optoelectronic devices such as photovoltaic panels and concentration photovoltaic systems. A simple method to enhance the transmission of quartz slides is presented here by fabricating multiscale tapered pillars on both sides of the quartz slides. The multiscale tapered nanopillars, which introduced a refractive index gradient on both surfaces, were created by reactive ion etching with dewetted Ag thin films as masks. The presence of the gradient on both surfaces greatly reduces the loss of light caused by reflection, which will enhance the total transmission light. Excellent transmission over the visible and near infrared region is achieved after optimizing the parameter of the structure. The transmission of the dual-sided structured quartz is enhanced to higher than 99% over wavelengths from 650 to 850 nm. Meanwhile, the structured quartz exhibits an antifogging property which is needed in optical and optoelectronic devices. † Electronic supplementary information (ESI) available: Details of Ag nanoparticles formed by thermal dewetting, SEM images of the deposited Ag lms of different thicknesses, Photographs of the dual-sided structured lens and plan convex lens are given. See

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“…This journal is © The Royal Society of Chemistry 2015 occurs due to the increased surface energy in the metal lm by heating. 39,40 The dewetting results are shown in Fig. 2A-C.…”

Section: Resultsmentioning

confidence: 99%

Fabrication of biomimetic patterns for high transmission and antifogging property

Xü

Liu

et al. 2015

RSC Adv.

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“…For more precise manufacturing, hybrid methods need to be applied to fabricate monolithic molds with both micro-and nanostructures in the same mold, e.g., by mixing and matching different methods. 20 However, the specific advantage of surface patterns could be compromised if nanostructures are not placed on the top or the bottom of a 2 1 = 2 D or 3D structure, and if they are allowed to interfere with molding of the microelements. For instance, when high aspect ratio pillars cover areas of the mold, which does not enable demolding along a defined axis, distortions and even rupture are inevitable.…”

Section: Discussionmentioning

confidence: 99%

Surface-patterned micromechanical elements by polymer injection molding with hybrid molds

Schift¹,

Urwyler²,

Kristiansen³

2013

Journal of Vacuum Science & Technology B, Nanotechnology an

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“…Although this residual layer will not be a problem for some applications, for the correct optical behavior of PNFs, it needs to be reduced at least by a factor 10. Thinner initial layers were not possible because of the low density of trenches; thus, the restrictions involved in squeeze flow as well as capillary effects involving lateral flow caused clogging at the PNF interfaces and depletion within the trenches 54 .…”

Section: T-and Uv-nilmentioning

confidence: 99%

High-aspect-ratio nanoimprint process chains

et al. 2017

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Different methods capable of developing complex structures and building elements with high-aspect-ratio nanostructures combined with microstructures, which are of interest in nanophotonics, are presented. As originals for subsequent replication steps, two families of masters were developed: (i) 3.2 μm deep, 180 nm wide trenches were fabricated by silicon cryo-etching and (ii) 9.8 μm high, 350 nm wide ridges were fabricated using 2-photon polymerization direct laser writing. Both emerging technologies enable the vertical smooth sidewalls needed for a successful imprint into thin layers of polymers with aspect ratios exceeding 15. Nanoridges with high aspect ratios of up to 28 and no residual layer were produced in Ormocers using the micromoulding into capillaries (MIMIC) process with subsequent ultraviolet-curing. This work presents and balances the different fabrication routes and the subsequent generation of working tools from masters with inverted tones and the combination of hard and soft materials. This provides these techniques with a proof of concept for their compatibility with high volume manufacturing of complex micro-and nanostructures.Keywords: cryo-etching; direct 6 write laser lithography; high aspect ratio; moulding; nanoimprint lithography; Ormocer; photonic nanofences; 2-photon polymerization INTRODUCTION High-aspect-ratio microstructures (HARMS), that is, structures with a large height/width ratio, have found many applications 1,2 such as X-ray gratings 3 , gas chromatography columns 4 , magnetic coils 5 , X-ray telescopes 6 , micro-gears 7 , micro-capacitors with highaspect-ratio (HAR) cantilevers 8 , and micromechanical and microoptical elements 9,10 . These structures exhibit aspect ratios (ARs) of over 10 and almost vertical sidewalls, making them much more challenging to develop than the structures typically used in planar technology with moderate ARs of 1 to 2. They are therefore characterized by an intermediate state between two-and threedimensional (2D and 3D), that is, a 2D planar design that is extended into the vertical dimension and often called . There are several methods to produce HAR structures on typical planar substrates, most of them relying on the anisotropy of subtractive pattern transfer of a low AR masking layer into an underlying resist or substrate, that is, by using mask based ultraviolet (UV)-photolithography (PL) with an AR up to 5, silicon etching (for example, dry etching) with an AR up to 20, and direct write laser lithography (DWL) and X-ray lithography with ARs 420 (Refs. 12-15). These methods are continually being improved to produce a higher AR and smaller lateral dimensions. Furthermore, they are enlarged by new techniques that are often subsets of etching processes with different advantages and disadvantages. One of those challenges is the suitability for submicron and nanopatterning, that is, structures with lateral sizes much smaller than 1 μm and the possibility to combine micro-with nanostructures in the same material.There are three main approaches: (1)...

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Fabrication of ordered nanospheres using a combination of nanoimprint lithography and controlled dewetting

Cited by 5 publications

References 11 publications

Fabrication of biomimetic patterns for high transmission and antifogging property

Fabrication of biomimetic patterns for high transmission and antifogging property

Surface-patterned micromechanical elements by polymer injection molding with hybrid molds

High-aspect-ratio nanoimprint process chains

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