Fabrication of microstrips of iron-based superconductor NdFeAs(O,H)
Atsuro Yoshikawa,
Takafumi Hatano,
Hiroto Hibino
et al.
Abstract:NdFeAs(O,H) microstrips with line widths of about 1–5 µm were fabricated by photolithography and Ar-ion dry etching. The microstrips were fabricated under two different etching conditions: 25 min etching at a power of 20 W (long duration, low power) and 3 min etching at 100 W (short duration, high power). For both conditions, the narrowest microstrips, which were 0.9 µm in width, retained high critical temperatures of about 85% of those before microfabrication. Further, the 0.9 µm microstrip fabricated under t… Show more
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