Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe

Chen, Guodong; Zheng, Jijian; Wang, Zhengwei; Zhang, Kui; Mo, Zhichang; Liu, Xing; Gao, Tianyu; Wei, Jingsong

doi:10.1016/j.jallcom.2021.158988

Cited by 19 publications

(11 citation statements)

References 24 publications

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“…The development of the AIST resist is generally carried out in a solution of 17% ammonium sulfide. [22,23] However, hydrolysis of the ammonium sulfide releases toxic and corrosive hydrogen sulfide gas, which causes serious air pollution and potential danger to operators. Furthermore, this photoresist development process not only has a low etching rate, but also generates inhomogeneous structures.…”

Section: Introductionmentioning

confidence: 99%

Electrochemical Strategy for High‐Resolution Nanostructures in Laser‐Heat‐Mode Resist Toward Next Generation Diffractive Optical Elements

Wang

Chen

Wen

et al. 2022

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For achieving high‐resolution nanostructures for next‐generation diffractive optical elements (DOEs) using an environmentally friendly process, an electrochemical development strategy is proposed and developed using AgInSbTe‐based laser heat‐mode resist (AIST‐LHR). Based on the electrical resistivity difference of amorphous and crystalline phases for this resist, an etching selectivity ratio of ≈30:1 (i.e., the etch ratio between the amorphous and crystalline ones) is achieved through the oxidation of Fe3+ ions with the assisted pitting activation etching using Cl− ions in an acid medium. Nanostructures with a minimum feature size down to 41 nm are successfully generated, including grating patterns, meta‐surface optical structures, gears, and English characters. Using a post‐plasma etching process, the nanostructures are successfully transferred from the AIST‐HLR onto silica substrate, and X‐ray grating patterns with a line space of 80 nm are created as a demonstration for its potential applications in DOEs.

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Section: Introductionmentioning

confidence: 99%

Electrochemical Strategy for High‐Resolution Nanostructures in Laser‐Heat‐Mode Resist Toward Next Generation Diffractive Optical Elements

Wang

Chen

Wen

et al. 2022

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“…Moreover, high density (the duty cycle of 1:1), multiscale (the minimum size varying from 90 nm to 2.7 μm), and arbitrary patterns have also been realized [15] . Besides, chalcogenide heat-mode resist also exhibits high etching resistance, and the patterns can be transferred onto various substrates, including silicon [11,16] , fused silica glass [12,17] , GaAs [18] , etc. These researches have greatly promoted the development of laser lithography.…”

Section: Introductionmentioning

confidence: 99%

AgGeSbTe thin film as a negative heat-mode resist for dry lithography

Chen

Wang

et al. 2022

Chin. Opt. Lett.

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An AgGeSbTe thin film is proposed as a negative heat-mode resist for dry lithography. It possesses high etching selectivity with the etching rate difference of as high as 62 nm/min in CHF 3 =O 2 mixed gases. The etched sidewall is steep without the obvious lateral corrosion. The lithographic characteristics and underlying physical mechanisms are analyzed. Besides, results of X-ray diffraction, Raman spectroscopy, and X-ray photoelectron spectroscopy further indicate that laser irradiation causes the formation of Ge, Sb, and AgTe crystals, which is the basis of etching selectivity. In addition, the etching selectivity of Si to AgGeSbTe resist is as high as 19 at SF 6 =Ar mixed gases, possessing good etching resistance. It is believed that the AgGeSbTe thin film is a promising heat-mode resist for dry lithography.

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“…[28] It is interesting to find that the amorphous and laser-induced crystallized phases of GST demonstrate different etching rates under specific etchants, which makes the micro/nanostructures on GST achievable by combining localized laser-induced phase change and subsequent wet etching process. [29][30][31][32][33] This mask-free laser surface structuring technique is potential for large-area nanopatterning of phasechange metasurface at low cost. More systematic processing optimization and thorough designs need to be done to bring this fabrication technique into realization of a useful large-area functional device.…”

Section: Introductionmentioning

confidence: 99%

Large‐Scale Laser Nanopatterning of Multiband Tunable Mid‐Infrared Metasurface Absorber

Yuan

Huang

et al. 2022

Advanced Optical Materials

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Large‐scale nanopatterning at low cost and high throughput is crucial to the practical applications of metasurfaces. Phase‐change materials equipped in these metasurfaces as modulation layers or resonators are generally applied to achieve a tunable function and have attracted significant attention. Here, an efficient method is developed by combining ultrafast laser localized modification/ablation and subsequent etching to fabricate nanostructures on a phase‐change material, Ge2Sb2Te5 (GST), over a wafer‐sized area. The localized laser treatments under gradually increased laser fluences contribute to the variety of achievable nanostructures including disk and ring structures, whose feature sizes and periods can be tuned by adjusting laser parameters and subsequent etching conditions. A mid‐infrared metasurface absorber is designed and fabricated by using the GST ring units as resonators. Notably, varying the geometrical features of rings allows generating dual‐band and tri‐band absorption peaks in the mid‐infrared spectral range, whose peak absorptivity can reach ≈92%. By converting GST from amorphous to crystalline state, a broad absorption spectral redshift of 700 nm is achieved. The large‐area high‐throughput fabrication together with high‐absorption design demonstrates their potential in mass production of phase‐change metasurface‐based absorbers.

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Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe

Cited by 19 publications

References 24 publications

Electrochemical Strategy for High‐Resolution Nanostructures in Laser‐Heat‐Mode Resist Toward Next Generation Diffractive Optical Elements

Electrochemical Strategy for High‐Resolution Nanostructures in Laser‐Heat‐Mode Resist Toward Next Generation Diffractive Optical Elements

AgGeSbTe thin film as a negative heat-mode resist for dry lithography

Large‐Scale Laser Nanopatterning of Multiband Tunable Mid‐Infrared Metasurface Absorber

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