Fabrication of metallic nanostructures by atomic force microscopy nanomachining and lift-off process

Abstract

Articles you may be interested inReproducible nanostructure fabrication using atomic force microscopy indentation with minimal tip damageWe report the fabrication of metallic nanostructures by atomic force microscopy nanomachining on a thin resist and subsequent metal coating and lift-off. Nanodots with a size of 70 nm, nanowires with a width of 120 nm, and nanoelectrodes with a gap of 50 nm have been successfully created. Theoretical estimates of the minimum force for a satisfactory lift-off are also given and found to be consistent with the experimental value. The present work demonstrates the feasibility and effectiveness of using a single-layer resist in comparison with a two-layer resist.

Etching Masks Based on Miniemulsions: A Novel Route Towards Ordered Arrays of Surface Nanostructures

“…[9] Smaller diameters of the order of 30 nm should be obtainable by nanomachining a poly(methyl methacrylate) PMMA resist with an atomic force microscope and subsequent metal-coating and lift-off, thereby accepting the disadvantage of a nonparallel process. [10] Note that the recently developed technique of controlling the diameter of nanopores in ultrathin Si/SiO 2 membranes by the electron beam of a transmission electron microscope is still a nonparallel procedure.[11] Another approach to preparing nanoholes in Si is based on self-organized porous alumina masks in combination with anisotropic Cl 2 reactiveion etching (RIE). [12] In this way, holes with diameters > 13 nm and an aspect ratio of 3 could be obtained.…”

Scanning probe lithography for fabrication of Ti metal nanodot arrays

“…The patterned Ti nanodot showed a shape of columnar cylinder with 60 nm of thickness. The fabricated metal nanodot arrays have 200 nm of diameter and 500 nm of interdistance, which corresponds to a density of 4 Â 10 8 /cm 2 [18]. We used an Au/Cr coated cantilever (NSG10/Au, NT-MDT) for indentation process.…”

Single nanoparticle alignment by atomic force microscopy indentation

“…After oven curing at 170°C for 30 min, a cone shaped nanosized dent hole pattern was made by AFM indentation. 11 To remove the bulge formed at the rim of the PMMA dent hole, we placed an appropriate amount of a DI water and IPA solution on the PMMA in an ac or dc electric field under ambient conditions. The images in Fig.…”