Fabrication of metal nano-wires by laser interference lithography using a tri-layer resist process

Fang, Yutao; Dai, Li‐Xin; Yang, Fan; Yue, Gen; Zuo, Peng; Chen, Hong

doi:10.1007/s11082-015-0286-z

Cited by 3 publications

(2 citation statements)

References 20 publications

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“…SX AR-P 3500/6 (Allresist, GmbH, Strausberg, Germany) was used as the interference lithography photoresist. Dilution is required as the reflected light from the substrate affects the desired pattern, limiting the thickness of the photoresist [21]. The compositions of the diluted photoresist are SX AR-P 3500/6 positive photoresist mixed with AR 300-12 at a ratio of 1:3.5.…”

Section: Methodsmentioning

confidence: 99%

The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography

Zhang

Xie

et al. 2019

Nanomaterials

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We report a method for fabricating periodic nanostructures on the surface of polydimethylsiloxane (PDMS) using laser interference lithography. The wave-front splitting method was used for the system, as the period and duty cycle can be easily controlled. Indium tin oxide (ITO) glass reveals favorable characteristics for controlling the standing waves distributed in the vertical direction, and was selected as the rigid substrate for the curing of the PDMS prepolymer, photoresist spin coating, and exposure processes. Periodic nanostructures such as gratings, dot, and hole arrays were prepared. This efficient way of fabricating large area periodic nanoscale patterns will be useful for surface plasmonic resonance and wearable electronics.

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Section: Methodsmentioning

confidence: 99%

The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography

Zhang

Xie

et al. 2019

Nanomaterials

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“…The samples were spin coated for 30 s. After spin coating, the samples were dried in the oven at 90 °C for 20 min. Dilution for this photoresist is required, as the reflected light from the substrate affects the desired pattern, which limits the thickness of the photoresist [38].…”

Section: Methodsmentioning

confidence: 99%

Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope

et al. 2019

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Patterning of lines of holes on a layer of positive photoresist SX AR-P 3500/6 (Allresist GmbH, Strausberg, Germany) spin-coated on a quartz substrate is carried out by using scanning near-field optical lithography. A green 532 nm-wavelength laser, focused on a backside of a nanoprobe of 90 nm diameter, is used as a light source. As a result, after optimization of parameters like laser power, exposure time, or sleep time, it is confirmed that it is possible to obtain a uniform nanopattern structure in the photoresist layer. In addition, the lines of holes are characterized by a uniform depth (71–87 nm) and relatively high aspect ratio ranging from 0.22 to 0.26. Numerical modelling performed with a rigorous method shows that such a structure can be potentially used as a phase zone plate.

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Fiber-based all-optical modulation based on two-dimensional materials

Zhang

Chen

et al. 2020

2D Mater.

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All-optical modulation with two-dimensional (2D) layered materials are becoming an indispensable tool in a variety of applications due to their superior performance in photonics and optoelectronics. Here, we review recent progress demonstrating the application of optical modulators utilizing their nonlinear optical properties of 2D materials. We focus specially on transition metal dichalcogenides, black phosphorus, and MXenes. We discuss the fabrication and integrating procedure of the layered materials and highlight recent demonstrations of all-optical passive modulators for ultrashort pulse generation and thermo-optic switches that applied in versatile interferometers. We also conclude with an outlook exploring the future perspectives that may accelerate the practical applications in this vibrant field.

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Fabrication of metal nano-wires by laser interference lithography using a tri-layer resist process

Cited by 3 publications

References 20 publications

The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography

The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography

Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope

Fiber-based all-optical modulation based on two-dimensional materials

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