2009
DOI: 10.1016/j.cap.2008.08.012
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Fabrication of metal nano dot dry etching mask using block copolymer thin film

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Cited by 15 publications
(8 citation statements)
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“…We have fabricated nanodots by using Au, Cr, Al, and Ni [9]. Ni showed better endurance than the other metals in the dry-etching process.…”
Section: Resultsmentioning
confidence: 99%
“…We have fabricated nanodots by using Au, Cr, Al, and Ni [9]. Ni showed better endurance than the other metals in the dry-etching process.…”
Section: Resultsmentioning
confidence: 99%
“…The structures of the DiBCP can serve as template/mask for patterning functional materials by dry etching [6] or deposition, e.g. of metals [10]. For pattern transfer as well as for deposition/lift-off purposes the vertical alignment of laminar patterns is important.…”
Section: Introductionmentioning
confidence: 99%
“…The synthesis of plasmonic nanoparticles (NPs) via top-down processes like Electron Beam Lithography [1,2], block copolymer photolithography [3], or nanosphere lithography [4,5] but also via bottom-up ways like chemical routes [6] have been deeply studied due to their high potential for applications in medicine [7], biosensing [8,9], hybrid photonic circuits [10,11], optical devices [12,13],… Among the family of plasmonic nanoparticles, silver nanoparticles exhibit appealing features like giant Surface Enhanced Raman Spectroscopy (SERS) enhancement [14,15]. In spite of their unique properties, Ag nanoparticles appear to be less attractive for applications than gold NPs whose properties are not altered by oxidation and thus are more stable [16].…”
mentioning
confidence: 99%