Fabrication of large-size photonic crystals by holographic lithography using a lens array

Liang, Bing; Liu, Yikun; Li, Juntao; Song, Liying; Li, Yongyao; Zhou, Jianying; Wong, Kam Sing

doi:10.1088/0960-1317/22/3/035013

Cited by 10 publications

(5 citation statements)

References 22 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…One of the techniques employed was to utilize lens array [41]. Four beams and four lenses were used to achieve a so-called umbrella-type intensity distribution to create a SU-8/air 3D face-centered cubic (FCC) photonic crystal structure ( Figure 13).…”

Section: Holographic Interference Lithographymentioning

confidence: 99%

Innovative SU-8 Lithography Techniques and Their Applications

2014

View full text Add to dashboard Cite

SU-8 has been widely used in a variety of applications for creating structures in micro-scale as well as sub-micron scales for more than 15 years. One of the most common structures made of SU-8 is tall (up to millimeters) high-aspect-ratio (up to 100:1) 3D microstructure, which is far better than that made of any other photoresists. There has been a great deal of efforts in developing innovative unconventional lithography techniques to fully utilize the thick high aspect ratio nature of the SU-8 photoresist. Those unconventional lithography techniques include inclined ultraviolet (UV) exposure, back-side UV exposure, drawing lithography, and moving-mask UV lithography. In addition, since SU-8 is a negative-tone photoresist, it has been a popular choice of material for multiple-photon interference lithography for the periodic structure in scales down to deep sub-microns such as photonic crystals. These innovative lithography techniques for SU-8 have led to a lot of unprecedented capabilities for creating unique micro-and nano-structures. This paper reviews such innovative lithography techniques developed in the past 15 years or so.

show abstract

Section: Holographic Interference Lithographymentioning

confidence: 99%

Innovative SU-8 Lithography Techniques and Their Applications

2014

View full text Add to dashboard Cite

show abstract

“…To solve this problem, a lens array was used to expand the interference region. [15] Unfortunately, a lens array is a multi-optical-axis system. It is quite difficult to avoid aberrations due to the unparallel optical axes and to the defects of small lenses.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Large Area Photonic Crystals with Periodic Defects by One-Step Holographic Lithography

Ma¹,

Wong

Li³

et al. 2015

Journal of the Optical Society of Korea

Self Cite

View full text Add to dashboard Cite

A one-step fabrication of a photonic crystal (PC) with functional defects is demonstrated. Using multi-beam phase-controlled holographic lithography with a diffracting optical element, large area one dimensional (1D) and two dimensional (2D) PCs with periodic defects were fabricated. The uniform area is up to 2 mm 2 , and tens of defect channels have been introduced in the 1D and 2D PC structure. This technique gives rise to substantial reduction in the fabrication complexity and significant improvement in the spatial accuracy of introducing functional defects in photonic crystals. This method can also be used to design and fabricate three dimensional (3D) PCs with periodic defects.

show abstract

“…2D and 3D interference patterns can be manipulated by controlling these properties. Specifically, 2D dot arrays and 3D lattice patterns can be fabricated with three and four-beam interference [36,37,40,118,119] as shown in the figure below. Figure 2-10 Periodicity that can be produced with different beam interferences [37].…”

Section: Interference Lithographymentioning

confidence: 99%

“…However, the multiple-laser beam interference system requires precision optic alignments and strict system stability [38,42,131,132]. To overcome this drawback, prism has been utilized as the beam splitter in IL for fast and large area fabrication of quasi-crystal structures [36,37,118,133]. The simple beam splitting process largely reduced the system vibration sensitivity.…”

Section: Interference Lithographymentioning

confidence: 99%

“…Holographic lithography possesses some advantages over IL in the aspect of system cost and system reliability[38,42,127,132]. Interference lithography requires accurate system alignment due to different light paths and vibrational instability, which is not required in the HL system.Phase mask is a surface relief grating with index variation in height direction, which could diffract incident laser beams accurately[36,38,42,118,127,132]. It is the most widely used simple hologram in the HL field nowadays.…”

mentioning

confidence: 99%

See 1 more Smart Citation

3D printing hydrogel scaffold and functional hydrogel for tissue engineering application

Hu¹

View full text Add to dashboard Cite

Fabrication of large-size photonic crystals by holographic lithography using a lens array

Cited by 10 publications

References 22 publications

Innovative SU-8 Lithography Techniques and Their Applications

Innovative SU-8 Lithography Techniques and Their Applications

Fabrication of Large Area Photonic Crystals with Periodic Defects by One-Step Holographic Lithography

3D printing hydrogel scaffold and functional hydrogel for tissue engineering application

Contact Info

Product

Resources

About