2011 International Symposium on Applications of Ferroelectrics (ISAF/PFM) and 2011 International Symposium on Piezoresponse For 2011
DOI: 10.1109/isaf.2011.6014121
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Fabrication of (K,Na)NbO<inf>3</inf> thin films on Si substrate by pulsed laser deposition

Abstract: We fabricated (Na,K)NbO 3 (NKN) thin films on (111)Pt/Ti/SiO 2 /(001)Si substrates at substrate temperature of 750 o C in O 2 gas pressure of 200 mTorr by pulsed laser deposition (PLD). The ferroelectric properties of the NKN thin films were improved by the insertion of a thin NKN or NN buffer layer. These buffer layers had an influence on composition control of the NKN films. The remanent polarization and the coercive electric field of the NKN films with the NN buffer layer were 15 μC/cm 2 and 40 kV/cm, respe… Show more

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