1990
DOI: 10.4139/sfj.41.325
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Fabrication of iridium oxide. Coated titanium substrate anode by using the electrophoretic deposition method.

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“…sputtering from a metallic iridium target in an oxygen plasma [17,[32][33][34], pulsed-laser ablation of iridium oxide targets [35], electrophoretic deposition [36], anodic or cathodic electrodeposition [19,24,37], induction heating [38], sol-gel processes [39], and electrochemical oxidation of iridium wires [9,16] or films [40].…”
Section: Introductionmentioning
confidence: 99%
“…sputtering from a metallic iridium target in an oxygen plasma [17,[32][33][34], pulsed-laser ablation of iridium oxide targets [35], electrophoretic deposition [36], anodic or cathodic electrodeposition [19,24,37], induction heating [38], sol-gel processes [39], and electrochemical oxidation of iridium wires [9,16] or films [40].…”
Section: Introductionmentioning
confidence: 99%