2015
DOI: 10.1021/acs.nanolett.5b02542
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Fabrication of High-Q Nanobeam Photonic Crystals in Epitaxially Grown 4H-SiC

Abstract: Silicon carbide (SiC) is an intriguing material due to the presence of spin-active point defects in several polytypes, including 4H-SiC. For many quantum information and sensing applications involving such point defects, it is important to couple their emission to high quality optical cavities. Here we present the fabrication of 1D nanobeam photonic crystal cavities (PCC) in 4H-SiC using a dopant-selective etch to undercut a homoepitaxially grown epilayer of p-type 4H-SiC. These are the first PCCs demonstrated… Show more

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Cited by 59 publications
(72 citation statements)
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References 38 publications
(81 reference statements)
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“…A second RIE step (STS ICP-RIE) transfers the pattern to the SiC wafer, which consists of a 250-nm p-type (Al, 5 × 10 17 cm −3 ) epilayer homoepitaxially grown on an n-type substrate (N, 10 19 cm −3 ). After pattern transfer, the n-type substrate is removed with a dopant-selective photoelectrochemical etch to provide optical isolation for the cavity (25,31). This procedure allows us to create cavities out of high-quality epitaxially grown material.…”
Section: Methodsmentioning
confidence: 99%
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“…A second RIE step (STS ICP-RIE) transfers the pattern to the SiC wafer, which consists of a 250-nm p-type (Al, 5 × 10 17 cm −3 ) epilayer homoepitaxially grown on an n-type substrate (N, 10 19 cm −3 ). After pattern transfer, the n-type substrate is removed with a dopant-selective photoelectrochemical etch to provide optical isolation for the cavity (25,31). This procedure allows us to create cavities out of high-quality epitaxially grown material.…”
Section: Methodsmentioning
confidence: 99%
“…This disparity between measured and theoretical Q is commonly observed in fabricated PCC devices (16-18, 20, 23). As discussed in previous work (25), the measured Q is often limited by fabrication imperfections, particularly those linked to reactive ion etching, like roughness, angled sidewalls, and other ion-induced damage. Other limiting factors may include absorption by the SiVs introduced to the devices and by other defects also created by the ion implantation.…”
Section: Significancementioning
confidence: 99%
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“…Among the solid-state emitters, color centers in diamond and silicon carbide [14,15] are the ones that feature high dipole moment and small inhomogeneous broadening (∆ < 30 GHz) needed for fast and scalable nanophotonics platform. Moreover, their integration with nanocavities is a topic of active research [16][17][18][19] paving the way for experimental demonstrations of color center based CQED. We consider theoretically the coherence effects in an N = 2 multi-emitter CQED system [ Fig.…”
mentioning
confidence: 99%
“…However, it is important to understand not only how to create high quality optical cavities in this material (to maximize cavitydefect coupling) but also how to do so while incorporating the desired defects. In previous work 18 , we have demonstrated the fabrication of 1D photonic crystal cavities (PCC) in 4H-SiC with high measured values of Q. Additionally, we have observed coupling of the PCC resonant modes to the emission of silicon vacancy defects that were created through C 12 ion implantation. In this work, we instead study arrays of nanobeam PCCs in 4H-SiC coupled to silicon vacancy defects generated through electron irradiation.…”
Section: Introductionmentioning
confidence: 92%