Fabrication of hexagonal star-shaped and ring-shaped patterns arrays by Mie resonance sphere-lens-lithography

Liu, Xianchao; Wang, Jun; Ling, Li; Gou, Jun; Zheng, Jie; Huang, Zehua; Pan, Rui

doi:10.1016/j.apsusc.2017.12.200

Cited by 13 publications

(8 citation statements)

References 36 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The diagrams above depict simulation results, while the experimental SEM results from the literature , are shown at the bottom. Image in (b3) is reproduced with permission from ref , copyright 2018 Elsevier. Images in (c) are reproduced with permission from ref , copyright 2014 Willey-VCH; ref , copyright 2013 ACS.…”

Section: Resultsmentioning

confidence: 99%

Analysis of the Pattern Shapes Obtained By Micro/Nanospherical Lens Photolithography

Yu,

Ma,

et al. 2023

Langmuir

View full text Add to dashboard Cite

Micro/nanospherical lens photolithography (SLPL) constitutes an efficient and precise micro/nanofabrication methodology. It offers advantages over traditional nanolithography approaches, such as cost-effectiveness and ease of implementation. By using micrometer-sized microspheres, SLPL enables the preparation of subwavelength scale features. This technique has gained attention due to its potential applications. However, the SLPL process has a notable limitation in that it mostly produces simple pattern shapes, mainly consisting of circular arrays. There has been a lack of theoretical analysis regarding the possible shapes that can be created. In our experiments, we successfully prepared annular and ring-with-hole pattern shapes. To address this limitation, we applied the Mie scattering theory to systematically analyze and summarize the various patterns that can be obtained through the SLPL process. We also proposed methods to predict and obtain different patterns. This theoretical analysis enhances the understanding of SLPL and expands its potential applications, making it a valuable area for further research.

show abstract

Section: Resultsmentioning

confidence: 99%

Analysis of the Pattern Shapes Obtained By Micro/Nanospherical Lens Photolithography

Yu,

Ma,

et al. 2023

Langmuir

View full text Add to dashboard Cite

show abstract

“…Many high-precision lithography techniques have been adopted to produce uniform and narrow-gap SERS substrates, such as electron beam lithography (EBL), focused ion beam (FIB) and nanosphere self-assembly. [31][32][33] Alternatively, laser interference lithography (LIL) represents a low-efficiency and highthroughput fabrication technique, [34][35][36] and one-dimensional gratings, and two-dimensional nanohole or nanodisk nanostructures have been fabricated to act as SERS substrates. Nonetheless, highly uniform hybrid metal-dielectric grating (HMDG) nanostructures have not yet been experimentally fabricated to act as UV-SERS substrates by the LIL technique.…”

Section: Introductionmentioning

confidence: 99%

Hybrid metal-dielectric gratings (HMDGs) as an alternative UV-SERS substrate

Zheng

Liu

Tian

et al. 2023

Phys. Chem. Chem. Phys.

Self Cite

View full text Add to dashboard Cite

show abstract

“…[ 15,16 ] The typical structure of the MA consists of sandwiched metal–insulator–metal (MIM) layers with patterned surfaces, and various patterns have been designed in previous works, such as triangle‐shaped, crescent‐shaped, hexagonal star, and so on. [ 17,18 ] In general, the prediction of a given MA is mainly based on iteratively solving Maxwell's equations by using EM simulation software in a bottom‐up way that relies on the expertise of the designer, thus, repeated trial calculations are often needed which is time‐consuming and lack of robustness. As an efficient design method for the MA, topology optimization has been proposed.…”

Section: Introductionmentioning

confidence: 99%

Classification and Inverse Design of Metasurface Absorber in Visible Band

Zhu³

et al. 2021

Advcd Theory and Sims

Self Cite

View full text Add to dashboard Cite

Metasurface absorber (MA) has been a research hotspot in the field of artificial electromagnetic structural material due to its dual advantages of high performance and compact design. Usually, the design of MA depends on the designer's professional knowledge, experience and physical inspiration. The desired optical response can be obtained by using electromagnetic simulation software to carry out hundreds or thousands of numerical calculations. Thus, it is still a challenge to quickly retrieve the optimal structure according to the desired optical response and realize the on‐demand inverse design. Besides, limited by the inner physics of the MA, it is not always possible to find the structural parameters corresponding to the desired spectrum. This paper not only takes the planar geometry and thickness of the structures into account but also realizes the probability classification of the desired spectra through the classification network. According to the classification results, the prediction network of the corresponding is selected to realize the on‐demand inverse design of MA. The proposed network model can design MA rapidly and accurately in a data‐driven way and can be flexibly applied to the design of other data‐enabled photonic devices, which is promising to become a comprehensive and effective design tool.

show abstract

Fabrication of hexagonal star-shaped and ring-shaped patterns arrays by Mie resonance sphere-lens-lithography

Cited by 13 publications

References 36 publications

Analysis of the Pattern Shapes Obtained By Micro/Nanospherical Lens Photolithography

Analysis of the Pattern Shapes Obtained By Micro/Nanospherical Lens Photolithography

Hybrid metal-dielectric gratings (HMDGs) as an alternative UV-SERS substrate

Classification and Inverse Design of Metasurface Absorber in Visible Band

Contact Info

Product

Resources

About