Carbon
microfibers make a promising candidate as textile reinforcement
for high temperature composites provided that their limitation of
thermal oxidation over 670 K in air is overcome. As such, this study
explored the potential of atomic layer deposition (ALD) for the deposition
of a substrate-nanolaminate interface layer for the design of a refractory
oxygen barrier coating applied to individual carbon microfibers within
a woven fabric. To this end, amorphous aluminum hydroxide was deposited
at 350 K in a flow-type thermal ALD reactor operating at a pressure
of 1.8 Torr, yielding a growth per cycle (GPC) of 1.0 Å/cycle.
The conformal aspect of the amorphous films was found to be well preserved
below a thickness of 45 ± 5 nm, above which reorganization of
the substrate surface by junction of the previously deposited layers
resulted in a uniform deposition. Furthermore, a minimal thickness
of 20 ± 2 nm was required to obtain self-standing films following
the thermal oxidation of the carbon microfibers. Indeed, thermal treatment
at 1380 K of the coated woven fabric induced multiple occurrences
of neat cracks in the aluminum oxide films, attributed to the increased
rigidity and mismatch between the respective thermal expansion coefficients.
The dense network of nanograins of aluminum oxide was further characterized
by using 4D-STEM, revealing multiple phases and orientations.