2015
DOI: 10.1016/j.jcrysgro.2015.01.018
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Fabrication of GaSb quantum rings on GaAs(0 0 1) by droplet epitaxy

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Cited by 8 publications
(8 citation statements)
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“…where k is the Boltzmann constant, and T is the temperature. Although holes in the GaSb layer are rapidly captured by the GaSb NSs [7], the PL emission from the GaSb layer can be observed even at high temperatures in the case of GaSb/GaAs QRs grown by droplet epitaxy [26]. Nonetheless, PL spectra at high temperatures for the GaSb/GaAs QRDSs in literature were just focused on the QR and QD peaks [27].…”
Section: Rate Equation Modelmentioning
confidence: 99%
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“…where k is the Boltzmann constant, and T is the temperature. Although holes in the GaSb layer are rapidly captured by the GaSb NSs [7], the PL emission from the GaSb layer can be observed even at high temperatures in the case of GaSb/GaAs QRs grown by droplet epitaxy [26]. Nonetheless, PL spectra at high temperatures for the GaSb/GaAs QRDSs in literature were just focused on the QR and QD peaks [27].…”
Section: Rate Equation Modelmentioning
confidence: 99%
“…From the fabrication point of view, droplet epitaxy is a growth technique that offers a high degree of freedom to engineer the morphology of self-assembled NSs in comparison with the Stranski-Krastanov (SK) method [23]. Droplet epitaxy can fabricate various kinds of the GaSb/GaAs NSs by tailoring the growth conditions [24][25][26][27]. Understanding of the optical properties and carrier dynamics is essential for the development of NS-based optoelectronic devices.…”
Section: Introductionmentioning
confidence: 99%
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“…For the undoped GaSb sample, these peaks are found at: P1 (0.959 eV), P2 (1.142 eV), P3 (1.319 eV) and P4 (1.485 eV), respectively. This PL peak energy range was reported only in GaSb-based nanostructures grown on GaAs substrate, such as quantum rings and quantum dots [16,17], and it is higher than the PL energy in most of the GaSb epilayers grown on GaAs reported previously (0.71-0.83 eV), [8,9,[18][19][20][21][22][23][24] regardless of the growth techniques and doping condition. We notice that the thickness of GaSb layers investigated in those reports range from 1 -20 µm, which is significantly larger than that of the samples studied in the current work, i.e.…”
Section: Resultsmentioning
confidence: 56%
“…For the same deposition amount, with the increase of deposition rate, the relaxation time of aluminum droplets decreases and the density of holes increases. The shorter relaxation time means that the diffusion length of aluminum atoms decreases (Kunrugsa et al 2015), so it is unable to converge into larger aluminum droplets, and the size of the hole decreases gradually. It is consistent with the characterization and verification of the sample in Fig.…”
Section: Surface Morphology Of Nanoporous Before and After Annealingmentioning
confidence: 99%