2009
DOI: 10.1002/adma.200803647
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Fabrication of Freestanding Nanoporous Polyethersulfone Membranes Using Organometallic Polymer Resists Patterned by Nanosphere Lithography

Abstract: Freestanding nanoporous polysulfone membranes are fabricated using nanosphere lithography, in which colloidal silica particles act as a template for the organometallic etch resist, which is composed of poly(ferrocenylsilanes). As shown in the figure, the membranes are robust enough to be removed from the silica wafers where they were produced. They can subsequently be used to separate particles of different sizes.

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Cited by 45 publications
(27 citation statements)
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“…Figure a shows the optical image of the macro­initiator film immersed in acetone after 20 s. The acetone diffuses through the film or from the side, dissolves the cellulose acetate, and releases the macroinitiator film from the substrate. Similar strategy has been used to release the nanoporous polyethersulfone membrane from silicon wafer and in fabrication of N ‐dodecylacrylamide polymer nanosheet deposited via Langmuir–Blodgett . The presence of wrinkles and ridges indicates the partial separation of the film from the silicon wafer.…”
Section: Resultssupporting
confidence: 92%
“…Figure a shows the optical image of the macro­initiator film immersed in acetone after 20 s. The acetone diffuses through the film or from the side, dissolves the cellulose acetate, and releases the macroinitiator film from the substrate. Similar strategy has been used to release the nanoporous polyethersulfone membrane from silicon wafer and in fabrication of N ‐dodecylacrylamide polymer nanosheet deposited via Langmuir–Blodgett . The presence of wrinkles and ridges indicates the partial separation of the film from the silicon wafer.…”
Section: Resultssupporting
confidence: 92%
“…Cross‐sectional schemes of nanoporous membranes fabricated through NSL: (A) PHEMA hydrogel brush membrane fabricated using PS nanospheres , (B) SiN membrane fabricated through a Cr etch mask produced from PS nanospheres , (C) aluminum oxide membrane fabricated by patterned anodization through PS nanospheres , and (D) polymeric membrane lifted‐off from its processing substrate by dissolving a cellulose acetate sacrificial layer .…”
Section: Nanosphere Lithographymentioning
confidence: 99%
“…Micrographs corresponding to fabricated membranes: (A) SiN membrane by self‐organizing polymers adapted from ; (B) polyethersulfone membrane by nanosphere lithography, adapted from ; (C) aluminum oxide membrane by anodization, adapted from ; (D) polystyrene membrane by nanoimprint lithography, adapted from ; and (E) silicon membrane by solid phase crystallization, adapted from .…”
Section: Introductionmentioning
confidence: 99%
“…Nanoparticles have also been used to fabricate porous membranes [92–94] . For example, McDonald et al.…”
Section: Separation Membranes Constructed From Inorganic Nanofibermentioning
confidence: 99%