Fabrication of amorphous silicon nitride thin films by radio-frequency sputtering assisted by an inductively coupled plasma

Ishii, Yuki; Kaneko, Tetsuya; Okimura, Kunio; Shindo, Haruo; Isomura, Masao

doi:10.1016/j.tsf.2017.01.022

Cited by 5 publications

(1 citation statement)

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“…These films also play important role in optoelectronic applications such as antireflection coatings and optimization of optical performance of devices due to its capability of providing the refractive index variation from silicon oxide like (~1.46) to stochiometric silicon nitride (~2.0) and by providing transparency in ultraviolet (250nm) to infrared (9µm) regions of optical spectrum [3]. Silicon nitride films can be produced through various methods such as atomic layer deposition [4], chemical vapor deposition and sputtering [5,6]. The advantage of sputtering technique over rest of two techniques is low temperature deposition which enables sputtering to employ the substrates that can't tolerate high temperatures.…”

Section: Introductionmentioning

confidence: 99%

Effect on Silicon Nitride thin Films Properties at Various Powers of RF Magnetron Sputtering

Mustafa¹,

Majeed²,

Iqbal³

2018

IJET

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Silicon nitride thin films have numerous applications in microelectronics and optoelectronics fields due to their unique properties. In this work, silicon nitride thin films were produced using radio frequency (R.F.) magnetron sputtering technique at various sputtering powers. The prepared thin films were characterized with XRD, FE-SEM, FTIR, surface profiler, AFM and spectral reflectance techniques for structure, surface morphology, chemical bonding information, growth rate, surface roughness and optical properties. The results showed that silicon nitride thin films were amorphous in nature. The films were smooth and densely packed with no voids or cracks at the surface. FTIR characterization informed about Si-N bonding existence which confirmed the formation of silicon nitride films. The sputtering power showed the impetus effect on growth rate, surface roughness and optical properties of produced films.

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