Fabrication of Aluminum Oxide Thin-Film Devices Based on Atomic Layer Deposition and Pulsed Discrete Feed Method

Lin, Sheng-Di; Wang, Ching-Chiun; Tien, Chuen‐Lin; Tung, Fu-Ching; Wang, Hsuan-Fu; Lai, Shih-Hsiang

doi:10.3390/mi14020279

Cited by 4 publications

(2 citation statements)

References 26 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…By performing a linear fit on the experimental data points, a slope of 0.1 was obtained. This indicates that the growth rate of alumina is approximately 0.1 nm per ALD cycle, which is consistent with previous findings reported in the literature [13,14]. However, it is worth noting that the measured film thickness does not perfectly align with the fitting curve in figure 3.…”

Section: Characterization Of Alumina Thin Filmssupporting

confidence: 89%

Performance evaluation of a single microchannel plate with large length-to-diameter ratio

Yan,

Liu,

Zhang

et al. 2023

J. Inst.

View full text Add to dashboard Cite

The conventional microchannel plate (MCP) detector has found widespread application in various fields. This article focuses on investigating the performance of a single MCP with a large length-to-diameter ratio (L/D) of 80:1, particularly for single electron counting. To enhance MCP performance, alumina with a high secondary electron yield (SEY) is coated onto the MCP using atomic layer deposition (ALD). The SEYs of alumina thin films with different thicknesses are measured using a pulsing electron beam method. The 80:1 L/D MCPs operate in electron counting mode, and the optimal alumina thickness is determined through a comparative study of MCP performance before and after coating. The relationships between maximum SEY, primary electron energy, gain, peak-to-valley ratio (P/V), and pulse height resolution (PHR) are analyzed. After alumina coating, the single 80:1 MCP exhibits improved gain, P/V and PHR. The optimal P/V and PHR of a single MCP as functions of the primary electron energy align with the relationship between the SEY of the alumina coating and the primary electron energy. Additionally, the variation of DC gain with extracted charge is investigated. This article provides valuable insights for parameter selection in achieving the optimal working state of MCP and explores the potential application of single electron counting using a single MCP.

show abstract

Section: Characterization Of Alumina Thin Filmssupporting

confidence: 89%

Performance evaluation of a single microchannel plate with large length-to-diameter ratio

Yan,

Liu,

Zhang

et al. 2023

J. Inst.

View full text Add to dashboard Cite

show abstract

“…Aluminum oxide (Al 2 O 3 ) films have been investigated for use in various applications, such as in semiconductor devices, organic light-emitting diodes, solar cells, lithium-ion batteries (LIBs), solid oxide fuel cells (SOFCs), and nuclear technology [1][2][3][4][5][6][7][8]. Numerous deposition techniques have been used to fabricate Al 2 O 3 thin layers for each application, such as atomic layer deposition (ALD) [9], pulsed laser deposition (PLD) [10], magnetron sputtering [11], the sol-gel method [12], and spray synthesis [13,14].…”

Section: Introductionmentioning

confidence: 99%

Al2O3 Thin Layer Formed inside Porous Membrane Using Spray Synthesis Method and Its Application

Imai,

Kubota,

Miyazawa

et al. 2024

Crystals

View full text Add to dashboard Cite

Aluminum oxide (Al2O3) films have been investigated for use in various applications, and numerous deposition techniques have been reported. The spray synthesis method has the advantage of forming a thin layer of crystal at low temperatures using the appropriate precursors. A precursor prepared by diluting Methylaluminoxane with N-methyl pyrrolidone was sprayed onto a porous membrane while varying conditions such as the substrate temperature, feeding speed, and spray amount. The solution penetrated the film during spray application, and the ultra-thin layers deposited on the side wall of the internal pores were observed using a cross-sectional transmission electron microscope (XTEM). The lattice image obtained using the TEM and the composition analysis conducted using a scanning TEM and an energy-dispersive X-ray spectroscope suggest that this thin layer is a layer of Al2O3. The formation of Al2O3 occurred at lower temperatures than in previous reports. This is a major advantage for applications with low-melting-point materials. The most suitable spraying conditions were determined based on the state of deposition on the surface and inside the membrane. These conditions were applied to a three-layer separator for lithium-ion batteries and their effect on thermal stability was investigated. Through heating experiments and XRD analysis, it was confirmed that the shrinkage and melting of the separator are suppressed by spraying. This process can be expected to have wide applications in low-melting-point materials such as polyolefin.

show abstract

Computational fluid dynamics modeling of a discrete feed atomic layer deposition reactor: Application to reactor design and operation

Tom,

Wang,

et al. 2023

Computers & Chemical Engineering

View full text Add to dashboard Cite

Fabrication of Aluminum Oxide Thin-Film Devices Based on Atomic Layer Deposition and Pulsed Discrete Feed Method

Cited by 4 publications

References 26 publications

Performance evaluation of a single microchannel plate with large length-to-diameter ratio

Performance evaluation of a single microchannel plate with large length-to-diameter ratio

Al2O3 Thin Layer Formed inside Porous Membrane Using Spray Synthesis Method and Its Application

Computational fluid dynamics modeling of a discrete feed atomic layer deposition reactor: Application to reactor design and operation

Contact Info

Product

Resources

About