2011
DOI: 10.1021/ja208670r
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Fabrication of All-Inorganic Nanocrystal Solids through Matrix Encapsulation of Nanocrystal Arrays

Abstract: A general strategy for low-temperature processing of colloidal nanocrystals into all-inorganic films is reported. The present methodology goes beyond the traditional ligand-interlinking scheme and relies on encapsulation of morphologically defined nanocrystal arrays into a matrix of a wide-band gap semiconductor, which preserves optoelectronic properties of individual nanoparticles while rendering the nanocrystal film photoconductive. Fabricated solids exhibit excellent thermal stability, which is attributed t… Show more

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Cited by 52 publications
(70 citation statements)
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“…The as-prepared films may be post treated with inorganic passivations-using methods such as atomic layer deposition 51 or successive ion layer adsorption and reaction 36 -to infiltrate the film and fully passivate any remaining bare surface sites. Another route to such a matrix could include fusing shell materials from core-shell nanoparticles via sintering 52 .…”
Section: Discussionmentioning
confidence: 99%
“…The as-prepared films may be post treated with inorganic passivations-using methods such as atomic layer deposition 51 or successive ion layer adsorption and reaction 36 -to infiltrate the film and fully passivate any remaining bare surface sites. Another route to such a matrix could include fusing shell materials from core-shell nanoparticles via sintering 52 .…”
Section: Discussionmentioning
confidence: 99%
“…27,28 The aim of the ALD coating is to serve as a gas diffusion barrier to stop oxidation, a nanoscale cement to inhibit solid-state diffusion within the films, and an electronic matrix that passivates surface states and reduces the size of the inter-QD tunnel barrier governing charge transport in QD films. Similar aims motivate the use of MCCs 1 and other strategies 29 to engineer the interdot matrix. ALD employs alternating selfsaturating surface reactions of gas-phase precursors to deposit conformal thin films of precisely controlled thickness.…”
mentioning
confidence: 86%
“…43,44 By using this strategy, ligand-free metal and semiconductor domains can be placed within small distances of each other to promote the enhanced energy transfer rate. Notably, both types of nanoparticles remain electrically "insulated" due to the wide gap of the interstitial matrix (either CdS or ZnS).…”
Section: Resultsmentioning
confidence: 99%
“…The thermal removal of ligands was confirmed by FTIR. 43 The presence of CdSe NCs in the film was evident through the characteristic band gap emission of fabricated solids at λ = 620 nm (Fig. 4b, red curve).…”
Section: ) (E) a Sem Image Of A (Au Cdse) Np Filmmentioning
confidence: 95%