Fabrication of a Micropatterned Ridge Embedded in a Magnetooptic Film

Abstract

We report the fabrication of a crystal or an amorphous micropatterned ridge buried in a magnetooptic film by use of the selectedarea sputter epitaxy. The ion-beam bombardment on the deposited amorphous film was found to be influential in crystal growth on an amorphous region. We successfully formed a crystalline single patterned-ridge with 3 µm width, whose cross section was inverted-trapezoidal, into an amorphous region, and an amorphous single patterned-ridge, whose cross section was triangular, into a crystal region.