Fabrication of 3D microchannels for tissue engineering in photosensitive glass using NIR femtosecond laser radiation

Brokmann, Ulrike; Milde, Tobias; Rädlein, Edda; Liefeith, Klaus

doi:10.1515/bglass-2019-0003

Cited by 14 publications

(11 citation statements)

References 43 publications

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“…Wet chemical etching is characterized by a high selectivity between glassy and crystallized areas, where the crystallized phase exhibits a much higher solubility in the etchant with typical etch rate ratios around 1:30. 90 RIE of photosensitive glasses appears to be significantly different from wet chemical etching. This is evident from the observation of an inversion of the etch selectivity between glassy and crystalline phases; see Fig.…”

Section: Fluorine-based Plasma Etching Process Versus Wet Chemical Etchingmentioning

confidence: 99%

“…Direct laser writing enables the local introduction of defined amounts of optical energy into the volume and, thus, the generation of buried 3D geometries, e.g., for optically transparent, fluidic systems [87][88][89][90] (see Fig. 10).…”

Section: Photoform Process For Micro-optical Componentsmentioning

confidence: 99%

“…[91][92][93][94][95] Roughness can be adopted specifically for the attachment of living cells in tissue engineering. 90 Other processing operations typical for glass, such as ion exchange or glass crystallization, enable the optimization of properties such as refractive index profile, spectral absorption, or mechanical strength. The applications are manifold, e.g., micromechanical and microfluidic functional elements can be functionalized with additional beam shaping and a filtering micro-optical component based on one material.…”

Section: Photoform Process For Micro-optical Componentsmentioning

confidence: 99%

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Perspectives of reactive ion etching of silicate glasses for optical microsystems

Weigel

Brokmann

Hofmann

et al. 2021

J. Optical Microsystems

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We provide a review of the latest research findings as well as the future potential of plasma-based etching technology for the fabrication of micro-optical components and systems. Reactive ion etching (RIE) in combination with lithographic patterning is a well-established technology in the field of micro-and nanofabrication. Nevertheless, practical implementation, especially for plasma-based patterning of complex optical materials such as alumino-silicate glasses or glass-ceramics, is still largely based on technological experience rather than established models. Such models require an in-depth understanding of the underlying chemical and physical processes within the plasma and at the glass-plasma/mask-plasma interfaces. We therefore present results that should pave the way for a better understanding of processes and thus for the extension of RIE processes toward innovative three-dimensional (3D) patterning as well as for the processing of chemically and structurally inhomogeneous silicate-based substrates. To this end, we present and discuss the results of a variety of microstructuring strategies for different application areas with a focus on micro-optics. We consider the requirements for refractive and diffractive micro-optical systems and highlight potentials for 3D dry chemical etching by selective tailoring of the material structure. The results thus provide first steps toward a knowledge-based approach to RIE processing of universal dielectric glass materials for optical microsystems, which also has a significant impact on other microscale applications. © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 International License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Section: Fluorine-based Plasma Etching Process Versus Wet Chemical Etchingmentioning

confidence: 99%

Section: Photoform Process For Micro-optical Componentsmentioning

confidence: 99%

Section: Photoform Process For Micro-optical Componentsmentioning

confidence: 99%

See 1 more Smart Citation

Perspectives of reactive ion etching of silicate glasses for optical microsystems

Weigel

Brokmann

Hofmann

et al. 2021

J. Optical Microsystems

Self Cite

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“…Mechanical processes like powder blasting [111] and jet micromachining [112] are also slow (<0.56 µm/s), but produce high surface roughness (up to 2.5 µm). On the other hand, thermal processes like CO 2 laser machining [113,114] and femtosecond laser machining [115,116] are generally the fastest (up to 20,000 µm/s), but irregularities and HAZ become a challenging factor. Although the speed of SACE technology is much slower than thermal methods [117], it can produce a considerably good surface roughness (<2 µm).…”

Section: Micro-hole Drillingmentioning

confidence: 99%

The Capabilities of Spark-Assisted Chemical Engraving: A Review

Bassyouni

Ziki

2020

JMMP

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Brittle non-conductive materials, like glass and ceramics, are becoming ever more significant with the rising demand for fabricating micro-devices with special micro-features. Spark-Assisted Chemical Engraving (SACE), a novel micromachining technology, has offered good machining capabilities for glass and ceramic materials in basic machining operations like drilling, milling, cutting, die sinking, and others. This paper presents a review about SACE technology. It highlights the process fundamentals of operation and the key machining parameters that control it which are mainly related to the electrolyte, tool-electrode, and machining voltage. It provides information about the gas film that forms around the tool during the process and the parameters that enhance its stability, which play a key role in enhancing the machining outcome. This work also presents the capabilities and limitations of SACE through comparing it with other existing micro-drilling and micromachining technologies. Information was collected regarding micro-channel machining capabilities for SACE and other techniques that fall under four major glass micromachining categories—mainly thermal, chemical, mechanical, and hybrid. Based on this, a figure that presents the capabilities of such technologies from the perspective of the machining speed (lateral) and resulting micro-channel geometry (aspect ratio) was plotted. For both drilling and micro-channel machining, SACE showed to be a promising technique compared to others as it requires relatively cheap set-up, results in high aspect ratio structures (above 10), and takes a relatively short machining time. This technique shows its suitability for rapid prototyping of glass micro-parts and devices. The paper also addresses the topic of surface functionalization, specifically the surface texturing done during SACE and other glass micromachining technologies. Through tuning machining parameters, like the electrolyte viscosity, tool–substrate gap, tool travel speed, and machining voltage, SACE shows a promising and unique potential in controlling the surface properties and surface texture while machining.

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“…[10][11][12] In recent years, there have been many researches on the fabrication of microchannel structures in various hard transparent materials by femtosecond laser technology, but all of them focus on a single microchannel structure and there is no comprehensive classification method. [4,[13][14] In this paper, the microchannel structure is innovatively divided into three categories: surface microchannels, 2D microchannels, and complex 3D microchannels, and focuses on the mechanism of femtosecond laser processing of transparent hard materials and the two most common microchannel laser processing methods. Then, different types of microchannels processed in various transparent hard materials, including glass, SiC, and sapphire, are summarized.…”

Section: Introductionmentioning

confidence: 99%

Femtosecond Laser Fabrication of Microchannels in Transparent Hard Materials

Wang

et al. 2023

Adv Materials Technologies

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The excellent characteristics of transparent hard materials such as high hardness, high transparency, corrosion resistance, and high temperature resistance enable their applications in microfluidic substrates even in harsh environments. Microchannels are important parts in microfluidic systems, and the preparation of microchannel structures in transparent hard materials deserves further in‐depth study. The traditional processing method is contact processing with large thermal influence and low processing efficiency, so it is impossible to obtain complex microchannels with high quality and high aspect ratio. The femtosecond laser processing is a non‐contact processing approach with no thermal damage, high processing accuracy, and easy to form complex microchannels, making it the best choice for processing microchannels in transparent hard materials. This work reviews the recent advances in femtosecond laser processing of transparent hard materials to form microchannel structures, focusing on the reaction mechanism, processing methods, and the obtained microchannel structures, including surface microchannels, 2D microchannels, and 3D microchannels. Furthermore, the application of microchannel structure in microfluidic field, including optical inspection and biochemical reaction, is also described.

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Fabrication of 3D microchannels for tissue engineering in photosensitive glass using NIR femtosecond laser radiation

Cited by 14 publications

References 43 publications

Perspectives of reactive ion etching of silicate glasses for optical microsystems

Perspectives of reactive ion etching of silicate glasses for optical microsystems

The Capabilities of Spark-Assisted Chemical Engraving: A Review

Femtosecond Laser Fabrication of Microchannels in Transparent Hard Materials

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