Fabrication Methods for Microscale 3D Structures on Silicon Carbide

Cho, Younghak; Hwang, Jiann‐Yang; Park, Min-Soo; Kim, Bo Hyun

doi:10.1007/s12541-022-00717-z

Cited by 17 publications

(2 citation statements)

References 152 publications

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“…Molten KOH is the only chemical method for etching SiC at room temperature. KOH etching can only be used for defect characterization of SiC materials due to its inhomogeneity and inefficiency of molten, and it cannot be used for the micromachining of SiC [6][7][8][9][10][11][12]. High-energy dry etching methods, such as inductively coupled plasma etching, are commonly used for SiC micromachining.…”

Section: Introductionmentioning

confidence: 99%

Electrochemical etching modes of 4H-SiC in KOH solutions

Yang

Zhao

Chen

et al. 2023

Semicond. Sci. Technol.

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Electrochemical etching is a promising wet etching technology for preparing porous structures and the flat surface etching of 4H-SiC. In this study, the effects of current density and KOH concentration on the etching of 4H-SiC were investigated. We found that the respective mechanisms for preparing porous structures and flat surface etching differed. The porous and flat etching modes were proposed to clarify the mechanistic differences. In addition, we achieved an etch rate of 1μm/h in flat etching mode, and the sample surface was improved for 4H-SiC applications in the field of optoelectronics and microelectronics through the thermal oxidation of SiC.

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Section: Introductionmentioning

confidence: 99%

Electrochemical etching modes of 4H-SiC in KOH solutions

Yang

Zhao

Chen

et al. 2023

Semicond. Sci. Technol.

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“…As the tool material, polycrystalline diamond (PCD) was used. Since PCD has a high hardness, it is suitable as a tool material for machining brittle materials such as glass, ceramics, cemented carbide and silicon carbide [ 17 ]. In this experiment, a microgrinding tool with a diameter of 300 µm fabricated via WEDG was used.…”

Section: Methodsmentioning

confidence: 99%

Microfluidic Chip Fabrication of Fused Silica Using Microgrinding

Lee

Sim

et al. 2022

Micromachines

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Although glass is in high demand as a material for microfluidic chips, it is still difficult to fabricate microstructures on glass. In this paper, polycrystalline diamond tools were fabricated through electrical discharge machining, and the microgrinding process for fused silica using the tools was studied. In order to improve the productivity, the machining effects of the high feed rate and depth of cut on the surface roughness of the channel bottoms and edge chipping were studied. A toolpath for the microchannels of a microfluidic chip was also studied and a microfluidic chip array was fabricated using this method.

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Voltage‐ and Metal‐assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review

Surdo,

Barillaro

2024

Small

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Sculpting silicon at the micro and nano scales has been game‐changing to mold bulk silicon properties and expand, in turn, applications of silicon beyond electronics, namely, in photonics, sensing, medicine, and mechanics, to cite a few. Voltage‐ and metal‐assisted chemical etching (ECE and MaCE, respectively) of silicon in acidic electrolytes have emerged over other micro and nanostructuring technologies thanks to their unique etching features. ECE and MaCE have enabled the fabrication of novel structures and devices not achievable otherwise, complementing those feasible with the deep reactive ion etching (DRIE) technology, the gold standard in silicon machining. Here, a comprehensive review of ECE and MaCE for silicon micro and nano machining is provided. The chemistry and physics ruling the dissolution of silicon are dissected and similarities and differences between ECE and MaCE are discussed showing that they are the two sides of the same coin. The processes governing the anisotropic etching of designed silicon micro and nanostructures are analyzed, and the modulation of etching profile over depth is discussed. The preparation of micro‐ and nanostructures with tailored optical, mechanical, and thermo(electrical) properties is then addressed, and their applications in photonics, (bio)sensing, (nano)medicine, and micromechanical systems are surveyed. Eventually, ECE and MaCE are benchmarked against DRIE, and future perspectives are highlighted.

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Fabrication Methods for Microscale 3D Structures on Silicon Carbide

Cited by 17 publications

References 152 publications

Electrochemical etching modes of 4H-SiC in KOH solutions

Electrochemical etching modes of 4H-SiC in KOH solutions

Microfluidic Chip Fabrication of Fused Silica Using Microgrinding

Voltage‐ and Metal‐assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review

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