2023
DOI: 10.1063/5.0138850
|View full text |Cite
|
Sign up to set email alerts
|

Fabrication method of GaN template for high-speed chemical lift-off

Abstract: In this study, a gallium nitride (GaN) template fabrication method for efficient chemical lift-off (CLO) is developed. CLO is slower than other lift-off methods. An air tunnel structure is formed using a photoresist to reduce the process time and improve the etchant penetration rate. Furthermore, an aluminum nitride (AlN) sacrificial layer is mounted on a trapezoid-shaped patterned sapphire substrate. GaN epitaxial growth is observed on the AlN sacrificial layer. The basic physical properties of the grown GaN … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
2

Relationship

1
1

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 15 publications
0
1
0
Order By: Relevance
“…The fabrication of a GaN template with an air-tunnel structure for a rapid CLO process was investigated in our previous study. Jeong et al [27] introduced a structural design for the CLO process using a sacrificial layer and relatively complex processes such as oxygen plasma treatment and ex situ sacrificial layer deposition.…”
Section: Introductionmentioning
confidence: 99%
“…The fabrication of a GaN template with an air-tunnel structure for a rapid CLO process was investigated in our previous study. Jeong et al [27] introduced a structural design for the CLO process using a sacrificial layer and relatively complex processes such as oxygen plasma treatment and ex situ sacrificial layer deposition.…”
Section: Introductionmentioning
confidence: 99%