“…Ion irradiation can thereby avoid the lethal side effects of conventional patterning, in particular for a few nm-thick pillar patterns. Various ferromagnetic metallic systems, such as Co/Pt, Co/Pd, CoCrPt/Cr superlattices, FeAl, and CrPt 3 , with ion sources such as He, Ar, Ga, and Xe in the energy range of 10s keV ∼ 10s MeV have been explored with successful results in magnetic nanopatterning. − Local destruction of an interfacial structure or a crystal structure in an atomic short-range-order by bombardment with accelerated ions has been a fundamental mechanism to achieve such patterning. However, unavoidable drawbacks of this method are (1) unwanted defect formations due to high energy or heavy ion bombardments; ,,, (2) cross-talk or exchange coupling between patterns through the unpatterned ferromagnetic medium, which results in a loss of control over magnetic switching; and (3) limitations in the use of various material systems such as oxides, nitrides, and sulfides.…”