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International Conference onIndium Phosphide and Related Materials, 2003.
DOI: 10.1109/iciprm.2003.1205304
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Fabrication and performance of InAs-based heterojunction bipolar transistors

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Cited by 8 publications
(2 citation statements)
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“…1,2 The use of strained alloys close in composition to InAs, such as Al x In 1−x As and InAs y P 1−y , adds further flexibility to the design of these devices. 3 Since the base layers of InAs-based heterojunction bipolar transistors are usually less than 50 nm, 3 shallow and thermally stable ohmic contacts are a critical factor for reliable high-speed devices. However, there are no reports available to our knowledge on contacts to p-InAsP, which is of interest for the base of some of these devices.…”
mentioning
confidence: 99%
“…1,2 The use of strained alloys close in composition to InAs, such as Al x In 1−x As and InAs y P 1−y , adds further flexibility to the design of these devices. 3 Since the base layers of InAs-based heterojunction bipolar transistors are usually less than 50 nm, 3 shallow and thermally stable ohmic contacts are a critical factor for reliable high-speed devices. However, there are no reports available to our knowledge on contacts to p-InAsP, which is of interest for the base of some of these devices.…”
mentioning
confidence: 99%
“…Even higher performance is expected for similar alloys with a lattice constant nearer to 6.3 Å as the InGaSb base would have an even narrower bandgap of $ 0.3 eV. In related work, several groups have recently reported the development of low-power npn HBTs with an InAs base [2][3][4][5].…”
mentioning
confidence: 99%