2013
DOI: 10.1117/12.2030144
|View full text |Cite
|
Sign up to set email alerts
|

Fabrication and metrology of high-precision freeform surfaces

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
3
0

Year Published

2014
2014
2024
2024

Publication Types

Select...
6
1

Relationship

1
6

Authors

Journals

citations
Cited by 14 publications
(3 citation statements)
references
References 0 publications
0
3
0
Order By: Relevance
“…MRF [12] and ion-milling [13] provide successful state-ofthe-art asphere surface finishing technologies. The MRF process routinely polishes surfaces to so-called 'super polish' leaving microroughness of the surface (parameter Ra) well below 1 nm [10].…”
Section: Mrf and Ion-milling Aspheric Surface Finishingmentioning
confidence: 99%
“…MRF [12] and ion-milling [13] provide successful state-ofthe-art asphere surface finishing technologies. The MRF process routinely polishes surfaces to so-called 'super polish' leaving microroughness of the surface (parameter Ra) well below 1 nm [10].…”
Section: Mrf and Ion-milling Aspheric Surface Finishingmentioning
confidence: 99%
“…In order to achieve higher precision freeform surface, sub-aperture deterministic polishing processes are necessary. [6,7] Deterministic polishing processes are dependent on the metrology method used to measure the initial figure error. The area of freeform metrology is currently under investigation by a number of different research groups.…”
Section: Current Freeform Optical Manufacturing and Testing Processesmentioning
confidence: 99%
“…The area of freeform metrology is currently under investigation by a number of different research groups. [7][8][9][10] Achievable surface form error of freeform surfaces is a function of the complexity of the shape and the uncertainty of the measurement method. A typical scanning probe coordinate measuring machine is limited to approximately ±1 µm PV form error.…”
Section: Current Freeform Optical Manufacturing and Testing Processesmentioning
confidence: 99%