Abstract:The highly ordered n-type porous Si template was prepared via electrochemical etching and back side illumination method. Pores of the Si template had squarish shape with side length of about 2 μm and depth of about 50 μm, respectively. Three growth stages, nucleation, self-assembly, and stable growth were observed by scanning electron microscope (SEM) during the formation process of the porous n-silicon template. Subsequently, nickel microtubes arrays were synthesized by electro-deposition. And the formation m… Show more
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