Fabrication and characterization of gold nanohole electrode arrays

Abstract

We report on the fabrication of gold nanohole electrodes array using combination of photolithography, deep reactive ion etching, wet etching, and focused ion beam lithography techniques. The electrode arrays were fabricated by drilling of nanoholes on a 100 nm silicon nitride membrane over a large area of titanium/gold thin film, exposing a disk-type gold nanoelectrode at the base of each hole. The electrode arrays were characterized using scanning electron microscopy (SEM), cyclic voltammetry (CV), and chronoamperometry (CA). SEM imaging of the arrays showed that the each hole is circular shape at the mouth and cone recessed disk (truncated cone) at the base. Near "steady-state" voltammetric behaviour was achieved for the oxidation of 1 mM ferrocenedicarboxylic acid in 10 mM phosphate buffered saline (PBS) at these electrode arrays. The steady-state responses at CV and CA increase with increasing the number of nanoholes in the array. Because of the reproducibility, accuracy, and miniaturization capability of the proposed fabrication technique we believe that it has potential applications in developing portable devices for biosensing.

Electrochemistry-based approaches to low cost, high sensitivity, automated, multiplexed protein immunoassays for cancer diagnostics

“…‘D’ depicts the current v/s time response curve for various concentrations of IL-6, while ‘E’ shows the immunoassay parameters as concentration of IL-6-specific current-response (Reprinted from ref. 30, Copyright 2014, with permission from Elsevier.…”

Frontiers of Nanoelectrochemistry and Application of Nanotechnology: A Vision for the Future

“…Rauf et al [6] did a phenomenal and groundbreaking research on the fabrication and characterization of gold nanohole electrode arrays. A fabrication method using photolithography, deep reactive ion etching, wet etching, and focused ion beam lithography techniques was discovered.…”

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Development of a microstructured surface using the FIB

“…20 FIB can be used to develop micro-or nanoscale structures with a very high degree of precision with a resolution of beam as low as 7 nm. FIB milling can be employed for a wide range of applications such as the study of coatings, 20 sectioning the cell-material interface, 21 fabrication of nanoelectrodes, 22 fabricating the ordered array of metallic nanoparticles, 23 light-trapping applications, 24 etc.…”