IEEE Symposium on Ultrasonics, 2003
DOI: 10.1109/ultsym.2003.1293299
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Fabrication and characterization of a new capacitive micromachined ultrasonic transducer (cMUT) using polysilicon as membrane and sacrificial layer material

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Cited by 7 publications
(7 citation statements)
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“…The CMUT fabrication based on surface micromachining method has been extensively studied since its inception in 1994 [1,[41][42][43][44][45][46][47][48][49][50][51][52][53][54]. A general surface micromachining process is illustrated in Figure 2.…”
Section: Surface Micromachiningmentioning
confidence: 99%
“…The CMUT fabrication based on surface micromachining method has been extensively studied since its inception in 1994 [1,[41][42][43][44][45][46][47][48][49][50][51][52][53][54]. A general surface micromachining process is illustrated in Figure 2.…”
Section: Surface Micromachiningmentioning
confidence: 99%
“…Because the membrane mode excitation amplitudes determined from (10) are proportional to the voltage v, (10) and (11) together determine the CMUT admittance.…”
Section: Description Of the Cmutmentioning
confidence: 99%
“…Noting that t (me) zz,l (x, y) equals t zz , we are able to calculate the impedance matrix for the different membrane modes. Combining this with (10) and (11), we get the harmonic admittance Y c (K x , K y , ω)…”
Section: Cmut Water Interfacementioning
confidence: 99%
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“…Eccardt, Niederer and colleagues showed a standard BiCMOS process with additional modifications [1012]. They also published another customized process using polysilicon as both membrane and sacrificial layer material [13]. Knight and Degertekin reported a low-stress plasma enhanced chemical vapor deposition (PECVD) for cMUTs fabrication, which is suitable for CMOS electronics integration on a single chip providing test arrays with significantly reduced parasitic capacitance [14,15].…”
Section: Introductionmentioning
confidence: 99%